Resist composition, method of forming resist pattern, novel compound, and acid generator
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsTakehiro Seshimo, Yoshiyuki Utsumi, Akiya Kawaue, Hideo Hada, Hiroaki Shimizu, Tsuyoshi Nakamura
Life of this patent
Estimating the term…
Abstract
A compound represented by general formula (I); and a compound represented by general formula (b1-1). [Chemical Formula 1] X-Q1-Y1—SO3−M+ (I) X-Q1-Y1—SO3−A+ (b1-1) wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO2— bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.
Claims16
A resist composition comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure,
- said acid-generator component (B) comprising an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below:
- [Chemical Formula 1]
- X-Q1-Y1—SO3−A+ (b1-1)
- wherein Q1 represents a divalent linkage group or a single bond;
- Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent;
- X represents a cyclic group which forms a ring skeleton and comprises 3 to 30 carbon atoms, which may have a substituent, and has a S atom of an —SO2— group in the ring skeleton thereof;
- and A+ represents an organic cation.
A compound represented by general formula (I) shown below:
- [Chemical Formula 2]
- X-Q1-Y1—SO3−M+ (I)
- wherein Q1 represents a divalent linkage group or a single bond;
- Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent;
- X represents a cyclic group which forms a ring skeleton and comprises 3 to 30 carbon atoms, which may have a substituent, and has a S atom of an —SO2— group in the ring skeleton thereof;
- and M+ represents an alkali metal ion.
A compound represented by general formula (b1-1) shown below:
- [Chemical Formula 3]
- X-Q1-Y1—SO3−A+ (b1-1)
- wherein Q1 represents a divalent linkage group or a single bond;
- Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent;
- X represents a cyclic group which forms a ring skeleton and comprises 3 to 30 carbon atoms, which may have a substituent, and has a S atom of an —SO2— group in the ring skeleton thereof;
- and A+ represents an organic cation.
Dependencies are inferred from the claim text.