Process and apparatus for organic vapor jet deposition
AssigneeThe Trustees of Princeton University
InventorsMax Shtein, Stephen R. Forrest
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Abstract
A method of fabricating an organic film is provided. A non-reactive carrier gas is used to transport an organic vapor. The organic vapor is ejected through a nozzle block onto a cooled substrate, to form a patterned organic film. A device for carrying out the method is also provided. The device includes a source of organic vapors, a source of carrier gas and a vacuum chamber. A heated nozzle block attached to the source of organic vapors and the source of carrier gas has at least one nozzle adapted to eject carrier gas and organic vapors onto a cooled substrate disposed within the vacuum chamber.
Claims34
A method of depositing an organic film, comprising:
- providing a heated non-reactive carrier gas transporting an organic vapor;
- and
- ejecting the heated non-reactive carrier gas transporting an organic vapor through a nozzle block with a bulk flow velocity at least as great as the thermal velocity of the molecules, onto a cooled substrate, to form a laterally-patterned organic film;
- the laterally-patterned organic film comprising a plurality of raised physical features, each feature covering an area of not more than about 10000 μm2.
A method of depositing an organic film, comprising:
- providing a heated non-reactive carrier gas transporting an organic vapor;
- and
- ejecting the heated non-reactive carrier gas transporting an organic vapor through a nozzle block, with a bulk flow velocity at least as great as the thermal velocity of the molecules, onto a cooled substrate, to form an organic film having a pattern;
- wherein the pattern comprises a plurality of laterally-spaced, raised physical features, each physical feature being deposited by a nozzle in the nozzle block.
Dependencies are inferred from the claim text.