Capacitive measurement method and system for nanoimprint process monitoring

A capacitive measurement method for an imprint process monitoring, comprising steps of:

• providing a master mold, said master mold comprising a patterned surface, first top electrode plate device, a second top electrode plate device, a first top wire, and a second top wire, wherein said first top electrode plate device is connected to a signal processing system through said first top wires, said second top electrode plate device is connected to the signal processing system through said second top wire, said first top electrode plate device is corresponding to a first structural section of said patterned surface, said second top electrode device is corresponding to a second structural section of said patterned surface, and said first structural section is different from said second structural section;
• providing a supporting base, said supporting base comprising a top surface, a first bottom electrode plate device, a second bottom electrode plate device, a first bottom wire, and a second bottom wire, wherein said first bottom electrode plate device is connected to the signal process system through said first bottom wire, and said second bottom electrode plate device is connected to the signal process system through said second bottom wire;
• arranging a substrate coated with a resist on the top surface of the supporting base;
• placing the master mold above the substrate so that the patterned surface is corresponding to the top surface, and to form a first capacitive device with said first top electrode plate device and said first bottom electrode plate device, and to form a second capacitive device with said second electrode plate device and said second bottom electrode plate device;
• imprinting the master mold onto the resist of the top surface of the substrate, wherein said first capacitive device is corresponding to a first capacitance varied by said resist imprinted by said first structural section, and said second capacitive device is corresponding to a second capacitance varied by said resist imprinted by said second structural section;
• and
• monitoring the imprinting according to the capacitance variation received by the signal processing system from said first capacitive device and said second capacitive device.