Resist stripping method and resist stripping apparatus

A resist stripping method for stripping a resist formed on a surface of a substrate using a resist stripping liquid produced by mixing a sulfuric acid and a hydrogen peroxide solution, comprising:

• a substrate holding step performed by holding the substrate to be processed with its surface directed upward by a substrate holding mechanism;
• a substrate rotating step performed by rotating the substrate held by the substrate holding mechanism around an axis crossing the surface of the substrate;
• a resist stripping liquid supplying step performed by supplying the resist stripping liquid to the surface of the substrate and stripping the resist during the substrate rotating step;
• a speed reducing step performed by reducing the rotational speed of the substrate from a first rotational speed to a second rotational speed lower than the first rotational speed during the resist stripping liquid supplying step;
• and
• after the speed reducing step, a puddling step performed by maintaining a liquid film formed by an amount of the resist stripping liquid by surface tension and without flowing on the surface of the substrate and thereby further stripping the resist;
• further comprising a supply position moving step performed by moving the position where the resist stripping liquid is supplied on the surface of the substrate from a peripheral portion of the substrate to a center of the substrate during the resist stripping liquid supplying step;
• and
• wherein in the supply position moving step, the movement of the supply position is stopped at the peripheral portion on the surface of the substrate only for a predetermined time period from the beginning of supply of the resist stripping liquid, and then the supply position is moved from the peripheral portion to the center.