Aqueous based residue removers comprising fluoride
AssigneeAir Products and Chemicals, Inc.
InventorsRoberto John Rovito, Aiping Wu
Life of this patent
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Abstract
A composition and method comprising same for selectively removing residues such as, for example, ashed photoresist and/or processing residues are disclosed herein. In one aspect, there is provided a composition for removing residue wherein the composition has a pH ranging from about 2 to about 9 comprising: a buffer solution comprising an organic acid and a conjugate base of the organic acid in a molar ratio of acid to base ranging from 10:1 to 1:10; a fluoride, and water, provided that the composition is substantially free of an added organic solvent. In another aspect, the composition may further comprise a corrosion inhibitor.
Claims11
A method of removing residue from a substrate comprising:
- applying a composition comprising:
- a buffer solution comprising an organic acid and a conjugate base of the organic acid in a molar ratio of acid to conjugate base ranging from 10:1 to 1:10;
- a fluoride;
- and 80% by weight or greater of water, wherein the composition has a pH ranging from about 2 to 7 and the composition is substantially free of an added organic solvent to the substrate at a temperature of from 20° C. to 80° C. for a period of time sufficient to remove the residue from the substrate.
A method for defining a pattern comprising:
- coating a photoresist onto at least a portion of the substrate;
- lithographically defining a pattern on the photoresist;
- transferring the pattern onto at least a portion of the substrate;
- etching the pattern into the substrate to form a patterned substrate
- heating the patterned substrate to a temperature sufficient to ash the photoresist and provide a residue;
- and
- removing the residue by contacting the patterned substrate with a composition comprising:
- a buffer solution comprising an organic acid and a conjugate base of the organic acid in a molar ratio of acid to conjugate base ranging from 10:1 to 1:10;
- a fluoride;
- and 80% by weight or greater of water, wherein the composition has a pH ranging from about 2 to 7 and the composition is substantially free of an added organic solvent.
Dependencies are inferred from the claim text.