Fabrication method of semiconductor integrated circuit device
AssigneesRenesas Eastern Japan Semiconductor, Inc., Renesas Technology Corp.
InventorsBunshi Kuratomi, Fukumi Shimizu
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AssigneesRenesas Eastern Japan Semiconductor, Inc., Renesas Technology Corp.
InventorsBunshi Kuratomi, Fukumi Shimizu
Estimating the term…
A method of fabricating a semiconductor integrated circuit device uses a mold which is provided with a plurality of air vents and movable pins which are formed such that the movable pins include grooves in the distal ends thereof which project into the air vents. By clamping the mold in a state such that the distal ends of the movable pins are pushed against a multi-cavity board at the time of clamping the mold, resin can be filled while leaking air inside the cavity through the grooves formed in the distal ends of the movable pins by setting the depths of the respective air vents to a fixed value irrespective of the irregularities in thickness of the multi-cavity boards. Accordingly, it is possible to prevent insufficient filling of resin in the cavity, the leaking of resin or defective welding, whereby the yield rate of products can be enhanced.
A method of manufacturing a semiconductor device comprising the steps of:
Dependencies are inferred from the claim text.