Loading patent…
AssigneeSchott AG
InventorsGunther Wehrhan, Regina Martin, Lutz Parthier, Joerg Staeblein, Martin Letz, Jochen Alkemper, Konrad Knapp, Klaus Petermann
Estimating the term…
The optical elements for ultraviolet radiation, especially for microlithography, are made from cubic granet, cubic spinel, cubic perovskite and/or cubic M(II)- as well as M(IV)-oxides. The optical elements are made from suitable crystals of Y3Al5O12, Lu3Al5O12, Ca3Al2Si3O12, K2NaAlF6, K2NaScF6, K2LiAlF6 and/or Na3Al2Li3F12, (Mg, Zn)Al2O4, CaAl2O4, CaB2O4 and/or LiAl5O8, BaZrO3 and/or CaCeO3. A front lens used in immersion optics for microlithography at wavelengths under 200 nm is an example of a preferred optical element of the present invention.
An optical element in a lens system for microlithography, said optical element comprising cubic spinel, and wherein said cubic spinel consists of (Mg, Zn)Al2O4, CaAl2O4, CaB2O4 and/or LiAl5O8.
An optical element in a lens system for microlithography, said optical element comprising cubic perovskite, and wherein said cubic perovskite consists of BaZrO3 and/or CaCeO3.
An optical element in a lens system for microlithography, said optical element comprising cubic M(II)-oxides and cubic M(IV)-oxides, and wherein said cubic M(II)-oxides and said cubic M(IV)-oxides are MgO and (Mg, Zn)O.
An optical element in a lens system for microlithography, said optical element comprising at least one material selected from the group consisting of cubic garnet, cubic spinel, cubic perovskite, cubic M(II)-oxides and cubic M(IV)-oxides, wherein said at least one material is crystalline and has a stress birefringence of less than 1 nm/cm at a wavelength of 193 nm, a uniformity of refractive index Δn of less than 1 ppm and a spectral absorption coefficient, Kini, at 193 nm of less than or equal to 2×10−3 cm−1.
A method of making an optical element for ultraviolet radiation, said method comprising the steps of:
A method of making an optical element for ultraviolet radiation, said method comprising the steps of:
An optical element in a lens system for microlithography, said optical element comprising at least one material selected from the group consisting of cubic perovskite, Lu3Al5O12, (Mg, Zn)Al2O4, MgO and (Mg, Zn)O;
A method of making an optical element for ultraviolet radiation, said method comprising the steps of:
A method of making an optical element for ultraviolet radiation, said method comprising the steps of:
An optical element in a lens system for microlithography, said optical element comprising at least one cubic garnet,
Dependencies are inferred from the claim text.