System and method for optical photomask inspection through pellicle

A system for optical photomask inspect through pellicle comprising:

• a. an optical analyzer for at least one of a reflectance and a transmittance measurement of a photomask and through a pellicle being on said photomask;
• b. a pellicle correction factor lookup table;
• c. a pellicle type specific correction factor that is at least one of stored and store able in said pellicle correction factor lookup table, said pellicle correction factor being computed from a first baseline measurement of a reference photomask without a reference pellicle and from a second baseline measurement of at least said reference pellicle;
• c. a computing subsystem for computationally accessing said pellicle correction factor lookup table such that at least one of said reflectance and transmittance measurement is computationally correctable for pellicle related optical distortions;
• and
• wherein said pellicle correction factor lookup table comprises a pellicle type marked bank, and wherein said pellicle type specific correction factor is stored in said pellicle type marked bank.