Method of fabricating an in-plane switching mode liquid crystal display comprising rubbing and applying a beam to set pre-tilt angles

A method of fabricating an in-plane switching mode liquid crystal display device, comprising:

• forming a gate line and a common line on a first substrate in a substantially horizontal direction a predetermined interval from each other;
• forming a data line on the first substrate in a direction substantially vertical to the gate line;
• forming a plurality of common electrodes substantially parallel to the data line and forming a plurality of pixel electrodes substantially parallel to the common electrodes, the common and pixel electrodes being arranged in an alternating pattern;
• forming a first alignment layer on the first substrate including the pixel electrode;
• performing a primary alignment treatment on the first alignment layer by rubbing to set a pre-tilt angle to about 1.5°˜5.0°;
• performing the secondary alignment treatment on an entire surface of the rubbed first alignment layer by applying a beam having a predetermined energy to set a same pre-tilt angle to about below 1° within the entire surface of the rubbed first alignment layer
• forming a color filter layer and a black matrix on a second substrate opposite the first substrate;
• forming a second alignment layer on the second substrate;
• performing the primary alignment treatment on the second alignment layer by the rubbing to set a pre-tilt angle to about 1.5°˜5.0°;
• performing the secondary alignment treatment on an entire surface of the rubbed second alignment layer by applying a beam having a predetermined energy to set a same pre-tilt angle to about below 1° within the entire surface of the rubbed second alignment layer;
• and
• forming a liquid crystal layer between the first and second substrates,
• wherein an alignment direction of the second alignment layer is set to be vertical to that of the first alignment layer,
• wherein the predetermined energy has a range of 0.5 to 2 J/cm2,
• wherein the beam is applied with the same energy on the entire surface of the rubbed first alignment layer, and
• wherein the beam is applied with the same energy on the entire surface of the rubbed second alignment layer.