Arc chamber for an ion implantation system
AssigneeUnited Microelectronics Corp.
InventorJung-Chi Chen
Life of this patent
Estimating the term…
Abstract
An arc chamber for an ion implantation system includes an exit aperture positioned at a wall of the arc chamber, filaments respectively positioned at two opposing sides within the arc chamber, and repeller structures respectively positioned at two opposing walls within the arc chamber between the filaments and the arc chamber. The repeller structure includes a repeller substrate with a screw axis for fitting the repeller structure to the arc chamber, an insulator positioned underneath the repeller substrate providing an electrical isolation between the repeller substrate and the arc chamber, and a conductive spacer covering a portion of the insulator positioned in between the insulator and the arc chamber.
Claims25
An arc chamber for an ion implantation system comprising:
- an exit aperture positioned at a wall of the arc chamber;
- filaments respectively positioned on two opposing sides within the arc chamber;
- and
- repeller structures respectively positioned at two opposing walls within the arc chamber between the filaments and the arc chamber, comprising:
- a repeller substrate with a screw axis for fitting the repeller structure to the arc chamber;
- an insulator positioned underneath the repeller substrate for providing an electrical isolation between the repeller substrate and the arc chamber;
- and
- a conductive spacer positioned in between the insulator and the arc chamber, the conductive spacer covering a portion of the insulator.
A repeller structure of an arc chamber comprising:
- a repeller substrate with a screw axis for fitting the repeller structure to an arc chamber;
- an insulator positioned underneath the repeller substrate for providing an electrical isolation between the repeller substrate and the arc chamber;
- and
- a conductive spacer positioned in between the insulator and the arc chamber, the conductive spacer covering a portion of the insulator.
Dependencies are inferred from the claim text.