US 7,679,055 B2 · Pattern displacement measuring method and pattern measuring device

Abstract

An evaluation method and apparatus is provided for evaluating a displacement between patterns of a pattern image by using design data representative of a plurality of patterns superimposed ideally. A first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image, a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image; and an superimposition displacement is detected between the upper layer pattern and lower layer pattern in accordance with the first distance and second distance.

Claims4

Dependent claims

A pattern displacement measuring method of measuring a distance between a line segment of design data and an edge of a charged particle radiation image, wherein:

a first distance is measured for an upper layer pattern between a line segment of the design data and an edge of the charged particle radiation image in accordance with a pattern matching between the line segment of the design data of the upper layer pattern and the charged particle radiation image;
a second distance is measured for a lower layer pattern between a line segment of the design data and an edge of the charged particle radiation image in accordance with a pattern matching between the line segment of the design data of the lower layer pattern and the charged particle radiation image;
and
a superimposition displacement is detected between said upper layer pattern and said lower layer pattern in accordance with said first distance and said second distance.

1 more element

Dependencies are inferred from the claim text.

Pattern displacement measuring method and pattern measuring device

Life of this patent

Pattern displacement measuring method and pattern measuring device

Life of this patent

Abstract

Claims4