Method of manufacturing a semiconductor device

A method of manufacturing a semiconductor device comprising the steps of:

• (a) preparing a semiconductor chip and a lead frame, said semiconductor chip having a main surface and a rear surface, opposite to said main surface, and including:
• a plurality of semiconductor elements and bonding pads formed on said main surface,
• an inorganic film formed to cover said main surface, said inorganic film having openings exposing said bonding pads, and
• an organic film formed to cover said inorganic film, said organic film having openings exposing said bonding pads;
• and
• said lead frame including:
• a die pad for supporting said semiconductor chip and a plurality of leads each having an inner lead and an outer lead which is continuously formed with said inner lead, said plurality of leads being arranged to surround said die pad, a size of said die pad being smaller than that of said semiconductor chip in a plan view;
• (b) mounting said semiconductor chip on said die pad such that said rear surface of said semiconductor chip is fixed to said die pad by an adhesive;
• (c) electrically connecting said inner leads of said plurality of leads with said plurality of bonding pads of said semiconductor chip by a plurality of bonding wires, respectively;
• and
• (d) sealing said semiconductor chip, said inner leads of said plurality of leads, said die pad and said plurality of bonding wires by a resin body, such that parts of said resin body are contacting said organic film of said semiconductor chip and a portion of said rear surface of said semiconductor chip except for an area to which said die pad is positioned,
• wherein the step of preparing said semiconductor chip further includes:
• (a1) coating an organic material above said inorganic film covering said plurality of semiconductor elements and baking said organic material at 180° C.;
• (a2) forming said openings, exposing said bonding pads by an etching process using a photo-resist film on said organic material as an etching mask;
• (a3) removing said photo-resist film by a resist removal liquid;
• (a4) after the removing of said photo-resist film, baking said organic material at 350° C. for 4 minutes or more;
• and
• (a5) dicing said semiconductor wafer to provide said semiconductor chip having said organic film.