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US 7,678,697 B2Granted
Substrate, device, method of manufacturing device, method of manufacturing active matrix substrate, electro-optical apparatus and electronic apparatus
AssigneeSeiko Epson Corporation
InventorToshimitsu Hirai
Life of this patent
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Abstract
A substrate on which a pattern is formed by a discharged functional liquid, includes a coating region coated with the functional liquid, and banks formed to enclose the coating region, wherein a difference between a contact angle of the functional liquid with respect to the coating region and a contact angle of the functional liquid with respect to the bank is above 40°.
Claims9
A method of manufacturing an active matrix substrate, comprising:
- forming a coating region on a substrate;
- forming banks to enclose the coating region;
- subjecting the coating region and the banks to a resurfacing treatment;
- and
- discharging a single droplet of functional liquid onto the substrate so that the single discharged droplet flows into the coating region, the single discharged droplet having a height below a height of the banks and touching each wall of the banks when within the coating region, a width of the coating region between the banks being smaller than a diameter of a single discharged droplet of the functional liquid,
- a difference between a contact angle of the single discharged droplet of the functional liquid with respect to the coating region and a contact angle of the functional liquid with respect to the bank being above 40°, and
- the contact angle of the single discharged droplet of the functional liquid with respect to the coating region being below 15°.
4 more elements
Dependencies are inferred from the claim text.