Mask and method for electrokinetic deposition and patterning process on substrates

A method for applying a pattern of charged particles to a non-conductive substrate comprising:

• applying a mask having a conducting layer, a dielectric layer, and mask openings to the substrate to with the conducting layer of the mask between the substrate and the dielectric layer to yield a masked substrate having unmasked surfaces defined by the mask openings;
• immersing the masked substrate in a bath containing the charged particles;
• and
• establishing an electrical potential between the conducting layer of the mask and a counter-electrode thereby electrokinetically attracting the charged particles to exposed surfaces on the conducting layer in the mask openings to deposit the charged particles in the mask openings.

A method for applying a pattern of charged particles to a substrate comprising:

• applying a mask to the substrate to yield a masked substrate comprising an electrically conducting layer, a dielectric layer adhered to the conducting layer, and mask openings which define a pattern for deposition of the charged particles onto the substrate;
• immersing the masked substrate in a bath containing the charged particles;
• and
• establishing an electrical potential between the conducting layer of the mask and a counter-electrode thereby electrokinetically depositing the particles through the mask openings onto areas of the substrate exposed in said mask openings.