Method for providing gas to a processing chamber
AssigneeApplied Materials, Inc.
InventorsSeshadri Ganguli, Ling Chen, Vincent W. Ku
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Abstract
A method and apparatus for generating gas for a processing system is provided. In one embodiment, an apparatus for generating gas for a processing system includes a canister having at least one baffle disposed between two ports and containing a precursor material. The precursor material is adapted to produce a gas vapor when heated to a defined temperature at a defined pressure. The baffle forces a carrier gas to travel an extended mean path between the inlet and outlet ports. In another embodiment, an apparatus for generating gas includes a canister having a tube that directs a carrier gas flowing into the canister away from a precursor material disposed within the canister.
Claims14
A method for generating gas for a processing system, comprising:
- providing a precursor material disposed in a lower region of a canister;
- flowing a carrier gas from an inlet port through an upper region of the canister along an extended mean path to an outlet port, wherein the extended mean path is created by a plurality of baffles prefabricated and disposed vertically in an upper region of the canister;
- and
- heating the precursor material to generate a process gas.
Dependencies are inferred from the claim text.