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US 7,677,885 B2Granted
Material supply device for diffusion furnaces
AssigneeLite-On Semiconductor Corp.
InventorsCheng-Yi Lin, Ying-Chieh Chan, Hsun-Min Lee
Life of this patent
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AssigneeLite-On Semiconductor Corp.
InventorsCheng-Yi Lin, Ying-Chieh Chan, Hsun-Min Lee
Estimating the term…
A material supply device for diffusion furnaces includes a main body, a fixing pedestal mechanism, a transmission mechanism and a cover mechanism for a furnace door. The main body includes a base portion and a main rod. The base portion is mounted on the main rod and the main rod extends through the base portion. The fixing pedestal mechanism is mounted on the main rod and is pivotedly mounted on a fixing pedestal. The transmission mechanism is mounted on the base portion and has a transmission rod slidably mounted on the base portion. The cover mechanism for a furnace door is fixed on an end of the transmission rod which is far away from the main body and is turnablely mounted on a cover of the furnace door. Based on the above assemblies, the present invention runs smoothly and improves production quality.
A material supply device for diffusion furnaces, comprising:
Dependencies are inferred from the claim text.