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US 7,677,877 B2Granted
Imprint lithography
AssigneeASML Netherlands B.V.
InventorsSander Frederik Wuister, Aleksey Yurievich Kolesnychenko, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
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Abstract
A lithographic apparatus is disclosed that includes an imprint template and a radiation source configured to cure photosensitive material, the radiation source including a laser or a light emitting diode. An imprint template is also disclosed.
Claims11
A lithographic apparatus, comprising:
- an imprint template;
- a radiation source configured to cure photosensitive material, wherein the radiation source includes a light emitting diode, and
- a holder from the template, the holder being provided with the light emitting diode.
A lithographic apparatus comprising:
- an imprint template;
- a radiation source configured to cure photosensitive material, wherein the radiation source includes a light emitting diode, and
- an optical fiber to optically connect the light emitting diode and the template.
A lithographic apparatus, comprising:
- an imprint template;
- and
- a radiation source configured to cure photosensitive material, wherein the imprint template includes a polymeric surface comprising the pattern to be imprinted and wherein monomers are grafted on the polymeric surface.
Dependencies are inferred from the claim text.