Polymer, resist protective coating material, and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Koji Hasegawa, Yuji Harada
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Abstract
A polymer comprising repeat units having formula (1) wherein R1 and R2 are hydrogen or C1-C12 alkyl, or R1 and R2 may bond together to form a ring, and R30 is hydrogen or methyl is used to formulate a resist protective coating material. A protective coating formed therefrom on a resist film is water-insoluble, dissolvable in alkali aqueous solution or alkaline developer, and immiscible with the resist film so that the immersion lithography can be conducted in a satisfactory manner. During alkali development, development of the resist film and removal of the protective coating can be simultaneously achieved.
Claims8
A resist protective coating material comprising a polymer comprising repeat units having any one of the following formulae group (i) to (xiv):
- a solvent comprising di-n-pentyl ether, diisopentyl ether or a mixture thereof.
Dependencies are inferred from the claim text.