Method and system for placing layout objects in a standard-cell layout

A computer-implemented method for placing a plurality of layout objects in a standard-cell layout, wherein the plurality of layout objects comprises at least one cell, the standard-cell layout comprising a plurality of placement sites, the method comprising:

• determining a cost function for the at least one cell based on interactions between the plurality of layout objects, wherein the cost function is a measure of cost for placing the at least one cell at a placement site;
• calculating a layout object perturbation distance of the at least one cell based on the cost function, wherein the layout object perturbation distance is the change in location of the at least one cell;
• adjusting the at least one cell by the layout object perturbation distance;
• and
• storing the adjusted at least one cell in a memory;
• wherein the at least one cell comprises at least one polysilicon shape, wherein the at least one polysilicon shape is formed by a combination of at least one gate polysilicon shape and at least one field polysilicon shape;
• wherein the step of calculating the layout object perturbation distance comprises determining a perturbation of spacing required for making the spacing between a selected layout object and an etch dummy into an assist-correct spacing and an etch-correct spacing, wherein the etch-correct spacing is an allowed spacing between the selected layout object and the etch dummy;
• and wherein all of the operations of the method are executed by a microprocessor.

A system for placing a plurality of layout objects in a standard-cell layout, wherein the plurality of layout objects comprises at least one cell, the standard-cell layout comprising a plurality of placement sites, the system comprising:

• a cost function module for determining a cost function for the at least one cell based on interactions between the plurality of layout objects, wherein the cost function is a measure of cost for placing the at least one cell at a placement site;
• a placement perturbation module for calculating a layout object perturbation distance of the at least one cell based on the cost function, wherein the layout object perturbation distance is the change in location of the at least one cell;
• and
• a standard-cell layout generator module for adjusting the at least one cell by the layout object perturbation distance;
• wherein the at least one cell comprises at least one polysilicon shape, wherein the at least one polysilicon shape is formed by a combination of at least one gate polysilicon shape and at least one field polysilicon shape;
• wherein the layout object perturbation distance equals a difference between an assist-correct spacing and a spacing between a polysilicon shape in the at least one cell and a polysilicon shape in an adjacent cell, wherein the assist-correct spacing is an allowed spacing between adjacent layout objects.

A computer program product for use with a computer, the computer program product comprising a computer usable medium having a computer readable program code embodied therein for placing a plurality of objects in a standard-cell layout, wherein the plurality of layout objects comprises at least one cell, the standard-cell layout comprising a plurality of placement sites, the computer program code performing the steps of:

• determining a cost function for the at least one cell based on interactions between the plurality of layout objects, wherein the cost function is a measure of cost for placing the at least one cell at a placement site;
• calculating a layout object perturbation distance of the at least one cell, based on the cost function, wherein the layout object perturbation distance is the change in location of the at least one cell;
• and
• adjusting the at least one cell by the layout object perturbation distance;
• wherein the step of calculating the layout object perturbation distance comprises determining a perturbation of spacing required for making the spacing between a selected layout object and an etch dummy into an assist-correct spacing and etch-correct spacing, wherein the etch-correct spacing is an allowed spacing between the selected layout object and the etch dummy.