Real-time fault detection and classification system in use with a semiconductor fabrication process

A real-time fault detection and classification (FDC) system in use with a semiconductor fabrication process comprising a first sub-fabrication process, the real-time fault detection and classification system comprising:

• a computer integrated manufacturing (CIM) host adopting the SEMI equipment communication standard (SECS), which is used to send a SECS control instruction;
• a semiconductor tool, which is used to execute the first sub-fabrication process, generate first status data in conformity with the SECS, and transfer the first status data to the CIM host according to the SECS control instruction;
• a non-semiconductor tool, which is used to execute the second sub-fabrication process and according to a non-SECS control instruction transformed from the SECS control instruction and being in conformity with a predetermined connectivity standard different from the SECS, generate second status data in conformity with the predetermined connectivity standard;
• a tool simulator connected between the CIM host and the semiconductor tool as well as the non-semiconductor tool, which is used to transfer the SECS control instruction of the CIM host to the semiconductor tool, transform the SECS control instruction to a non-SECS control instruction and send the non-SECS control instruction to the non-semiconductor tool, receive the first status data generated by the semiconductor tool and the second status data generated by the non-semiconductor tool, transform the second status data into third status data in conformity with the SECS, and transfer the first and third status data to the CIM host;
• wherein, after receiving the first and third status data, the CIM host classifies the first and third status data according to a predetermined classification technique so as to determine equipment health condition of the semiconductor tool and the non-semiconductor tool.