Photo development apparatus and method for fabricating a color filter substrate using the same
AssigneeLG Display Co., Ltd.
InventorSeung Han Paek
Life of this patent
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Abstract
A photo development apparatus for use in fabricating a color filter substrate for a display panel is disclosed. The disclosed photo apparatus includes a development solution supplier to supply a negative development solution. The photo apparatus also includes a first photo apparatus to form a positive photo-resist pattern to be used in forming a black matrix, wherein the positive photo-resist pattern is formed by patterning a light shielding layer formed on a substrate using the negative development solution and a positive photo-resist.
Claims15
A method of fabricating a color filter substrate for a display panel, comprising:
- forming a light shielding layer on a substrate;
- forming a positive photo-resist including an acrylic group resin and a novolak group resin on the light shielding layer;
- exposing portions of the positive photo-resist using a mask;
- supplying a first negative development solution;
- supplying a second negative development solution by controlling a concentration of the first negative development solution;
- forming a positive photo-resist pattern by developing the exposed portions of the positive photo-resist with the second negative development solution;
- and
- forming a black matrix by patterning the light shielding layer using the positive photo-resist pattern.
A method of fabricating a plurality of color filter substrates for display panels, comprising:
- forming a light shielding layer on a first substrate;
- forming a positive photo-resist including an acrylic group resin and a novolak group resin on the light shielding layer;
- exposing portions of the positive photo-resist using a mask;
- supplying a first negative development solution;
- supplying a second negative development solution by controlling a concentration of the first negative development solution;
- forming a positive photo-resist pattern by developing the exposed portions of the positive photo-resist with the second negative development solution;
- forming a black matrix by patterning the light shielding layer using the positive photo-resist pattern,
- forming a black resin layer on a second substrate;
- forming a negative photo-resist on the black resin layer;
- exposing portions of the negative photo-resist using a mask;
- and
- developing the exposed portions of the negative photo-resist with the first negative development solution to form a black matrix on the second substrate.
Dependencies are inferred from the claim text.