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US 7,629,401 B2Granted
Antistatic composition
AssigneeAdeka Corporation
InventorsTetsuji Abe, Hiroaki Shirai, Takayuki Tsuda
Life of this patent
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Abstract
The present invention provides an antistatic composition including: a polymer (A) containing a monomer unit represented by the following general formula (1): where R1 represents a hydrocarbon group having a benzene ring, A represents a methyl group or an ethyl group, and a plurality of A's may be the same or different from each other, m and n, each of which is an average polymerization degree of an oxyalkylene group, each represent a numeral of 1 or more, and p represents a numeral of 2 or more; and a low-molecular-weight anionic compound (B).
Claims10
An antistatic composition, comprising:
- a polymer (A) containing a monomer unit represented by the following general formula (1):
- where R1 represents a hydrocarbon group having a benzene ring, A represents a methyl group or an ethyl group, and a plurality of A's may be the same or different from each other, m and n, each of which is an average polymerization degree of an oxyalkylene group, each represent a numeral of 1 or more, and p represents a numeral of 2 or more;
- and
- a low-molecular-weight anionic compound (B).
1 more element
Dependencies are inferred from the claim text.