Light-emitting device on n-type InP substrate heavily doped with sulfur
AssigneeSumitomo Electric Industries, Ltd.
InventorsTomokazu Katsuyama, Michio Murata
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AssigneeSumitomo Electric Industries, Ltd.
InventorsTomokazu Katsuyama, Michio Murata
Estimating the term…
The present invention provides a structure of a light-emitting device which prevents the inter diffusion of impurities from the high-doped n-type InP substrate to a p-type current blocking layer. The substrate of the invention is highly doped with sulfur (S) to obtain high quality surface whose etch pit density (EPD) is less than 100 cm−2. The device includes such substrate, an optical guiding portion with an active layer, and a current blocking portion provided so as to bury the guiding portion. This current blocking portion includes, from the side of the substrate, a p-type layer, an n-type layer and another p-type layer. The device of the invention provides an n-type layer that is moderately doped with silicon between the n-type substrate and the p-type current blocking layer to prevent the inter diffusion of impurities from the substrate to the p-type layer.
A light-emitting device, comprising:
A semiconductor laser diode, comprising:
Dependencies are inferred from the claim text.