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AssigneeASML Netherlands B.V.
InventorsAndre Bernardus Jeunink, M'hamed Akhssay, Johannes Jacobus Matheus Baselmans, Franciscus Antonius Chrysogonus Marie Commissaris, Simon De Groot, Wim Tjibbo Tel, Alexander Hendrikus Martinus Van der Hoff, Arnout Van de Stadt, Remco Marcel Van Dijk
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A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration values, a modelling system configured to determine an application-specific effect of said predicted projection system aberration changes on at least one parameter of an image for a selected pattern, a control system configured to generate a control signal specific to the selected pattern according to said predicted projection system aberration changes and their application-specific effect on the at least one parameter of the image, and an image adjusting system, responsive to the control signal, to compensate for the application-specific effect of said predicted projection system aberration changes on the image.
A device manufacturing method using a lithographic projection apparatus, the method comprising:
A machine readable medium encoded with machine executable instructions for performing a method, the method comprising:
A method, comprising:
Dependencies are inferred from the claim text.