Method for manufacturing an LCD device defining a TFD structure using a second mask removing a first metal layer, an insulating layer and a second metal layer to expose a transparent electrode layer

A process for manufacturing an LCD device, comprising:

• (a) providing a substrate having a transparent electrode layer, a first metal layer and a first insulating layer thereon, wherein the transparent electrode layer is sandwiched between the substrate and the first metal layer, and the first metal layer is sandwiched between the first insulating layer and transparent electrode layer;
• (b) defining a patterned area having a TFD structure area and a pixel area by use of a first mask;
• (c) forming a second insulating layer and exposing the patterned area having the TFD structure area and the pixel area;
• (d) forming a second metal layer over the second insulating layer and the patterned area having the TFD structure area and the pixel area;
• and
• (e) defining the TFD structure area and the pixel area, and removing the second metal layer, the first insulating layer and the first metal layer on the pixel area to expose the transparent electrode layer by use of a second mask.