Method of selective coverage of high aspect ratio structures with a conformal film

A method for forming a dielectric film, the method comprising:

• a) providing in a deposition reaction chamber a substrate having a gap on a surface, the gap having a top opening and a surface area comprising a bottom and sidewalls running from the top to the bottom;
• b) selectively depositing a conformal silicon oxide-based dielectric film in the gap by:
• i. preferentially applying a film formation catalyst or a catalyst precursor on a portion representing less than all of the gap surface area, wherein the portion of the gap surface area where the preferential application of the catalyst or catalyst precursor occurs comprises the bottom of the gap,
• ii. selectively deactivating the catalyst or catalyst precursor at the top of the gap with an agent, and
• iii. exposing the substrate surface to a silicon-containing precursor gas such that a silicon oxide-based dielectric film layer is preferentially formed on said portion of the gap surface area.

A method for forming a dielectric film, the method comprising:

• a) providing in a deposition reaction chamber a substrate having a gap on a surface, the gap having a top opening and a surface area comprising a bottom and sidewalls running from the top to the bottom;
• b) selectively depositing a conformal silicon oxide-based dielectric film in the gap by:
• i. preferentially applying a film formation catalyst or a catalyst precursor on a portion representing less than all of the gap surface area, wherein the portion of the gap surface area where the preferential application of the catalyst or catalyst precursor occurs comprises the bottom of the gap, wherein a more active catalyst or catalyst precursor is applied at the bottom of the gap and a less active catalyst is applied at the top of the gap, and
• ii. exposing the substrate surface to a silicon-containing precursor gas such that a silicon oxide-based dielectric film layer is preferentially formed on said portion of the gap surface area.