Split-phase chamber modeling for chamber matching and fault detection
AssigneeApplied Materials, Inc.
InventorJohn M. Yamartino
Life of this patent
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Abstract
In at least one embodiment, the present invention is a method for thin-film process chamber data analysis, which includes acquiring chamber data, defining an adjustment portion of the chamber data and a steady-state portion of the chamber data, and forming a chamber model having an adjustment portion and a steady-state portion. The method can further include comparing the chamber model with a subject chamber to provide a chamber data comparison and utilizing the chamber data comparison.
Claims34
A method for thin-film process chamber data analysis, the method comprising:
- a) acquiring chamber data;
- b) defining an adjustment portion of the chamber data and a steady-state portion of the chamber data;
- c) forming a chamber model having an adjustment portion and a steady-state portion;
- and
- d) using the chamber model performing at least one of:
- 1) providing a user identifiable indication;
- or 2) performing a chamber adjustment.
A split-phase chamber analysis method comprising:
- a) executing a process run having at least one phase of operation;
- b) measuring at least one chamber variable during the at least one phase of operation to form chamber data;
- c) separating the chamber data into at least one adjustment portion and at least one steady-state portion for each of the at least one phase of operation;
- e) performing a multivariate analysis on the at least one adjustment portion and the at least one steady-state portion of the chamber data;
- and
- f) using results from the multivariate analysis performing at least one of:
- 1) providing a user identifiable indication;
- or 2) performing a chamber adjustment.
A thin-film chamber analysis method for chamber matching comprising:
- a) acquiring chamber model data from more than one known chamber;
- b) defining a transition portion and a steady-state portion of at least one process phase of the chamber model data;
- c) performing a multivariate analysis to form a chamber model with a transition portion and a steady-state portion;
- d) comparing the chamber model with a subject chamber during an offline analysis;
- and
- e) adjusting the subject chamber in response to the comparing of the chamber model with the subject chamber.
A thin-film chamber analysis method for fault detection comprising:
- a) acquiring chamber model data from more than one run of a chamber;
- b) defining a transition portion and a steady-state portion of at least one process phase of the chamber model data;
- c) performing a multivariate analysis to form a chamber model with a transition portion and a steady-state portion;
- d) comparing the chamber model with a subject process run of the chamber;
- and
- e) providing a user identifiable indication based on results of the comparing the chamber model with the subject process run.
Dependencies are inferred from the claim text.