Standard specimen for a charged particle beam apparatus, specimen preparation method thereof, and charged particle beam apparatus
AssigneeHitachi High-Technologies Corporation
InventorsToshie Yaguchi, Takeo Kamino, Yoshifumi Taniguchi
Life of this patent
Estimating the term…
Abstract
An object of the present invention is to provide a standard specimen for a charged particle beam enabling highly precise measurement of sub-micron to several 10 μm in size on an image and an apparatus using the standard specimen. In order to attain the above described object, the present invention provides a standard specimen for a charged particle beam including two different specimens for magnification or measurement calibration and a charged particle beam apparatus using the specimens.
Claims15
A standard specimen for a charged particle beam used for magnification or measurement calibration of a charged particle beam apparatus, wherein:
- the standard specimen is configured so that patterns arranged in a predetermined pitch are disposed on a material having a predetermined lattice structure, and
- the standard specimen has undergone film-thinning processing so as to enable the charged particle beam to transmit.
A standard specimen for a charged particle beam used for magnification or measurement calibration of a charged particle beam apparatus, wherein:
- the standard specimen is configured so that a material having a predetermined lattice structure is disposed between patterns arranged in a predetermined pitch, and
- the standard specimen has undergone film-thinning processing so as to enable the charged particle beam to transmit.
Dependencies are inferred from the claim text.