Thiol compound and photosensitive composition using the same
AssigneeShowa Denko K.K.
InventorsHirotoshi Kamata, Mina Onishi, Katsumi Murofushi
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Abstract
The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
Claims3
A secondary thiol compound, which is represented by the following formula (10):
A tertiary thiol compound which is represented by the following formula (11):
A method of producing a thiol compound represented by the following formula (1):
- wherein R1 represents a linear- or branched-chain alkylene group having 2 to 6 carbon atoms, R2 represents a linear- or branched-chain alkylene group having 1 to 6 carbon atoms, and n represents an integer of 1 to 4, characterized by subjecting a diol compound represented by the following formula (12):
- wherein R1 represents a straight- or branched-chain alkylene group having 2 to 6 carbon atoms and n is an integer of 1 to 4, to an esterification reaction with 3-mercaptobutyric acid or 2-mercaptoisobutyric.
Dependencies are inferred from the claim text.