# US 7,613,220 B2 · Two-wavelength semiconductor laser device and method for fabricating the same

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- Number: US 7,613,220 B2
- Document ID: US7613220B2
- Status: Granted
- Kind: B2
- Application number: 11/866,724
- Filed: 2007-10-03
- Published: 2008-04-03
- Granted: 2009-11-03
- Earliest claimed: 2006-10-03
- Assignees: Panasonic Corporation
- Inventors: Toru Takayama; Tomoya Satoh; Isao Kidoguchi
- Web page: https://patentgrep.com/patent/US7613220B2

## CPC

- H01S 5/4031: {Edge-emitting structures}
- H01S 5/162: {with window regions made by diffusion or disordening of the active layer}
- H01S 5/2059: {by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion}
- H01S 5/4087: {emitting more than one wavelength}
- H01S 2301/173: The laser chip comprising special buffer layers, e.g. dislocation prevention or reduction
- H01S: DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL

## Abstract

A first and second semiconductor laser, which comprise buffer layers, cladding layers, quantum well active layers, and cladding layers integrated on the substrate and have a stripe geometry, are integrated on a common substrate, with the quantum well active layers in the vicinity of the cavity facets disordered by impurity diffusion. Relationships λ1>λb1, λ2>λb2, λ1>λ2, and E1≦E2 are satisfied, where λ1 and λ2 are defined, respectively, as the emission wavelengths of the active layers of the first and second semiconductor lasers, E1 and E2, respectively, as the forbidden band energies of the buffer layers of the first and second semiconductor lasers, and λb1 and λb2 respectively as the wavelengths corresponding to the forbidden band energies of the buffer layers of the first and second semiconductor lasers. The generation of reactive currents flowing through the window portions, which is caused by the intensification of disordering performed for window region formation, can be appropriately suppressed for both types of integrated semiconductor lasers.

## Claims

### Claim 1

A two-wavelength semiconductor laser device having, integrated on a common substrate, a first infrared semiconductor laser and a second red semiconductor laser, each comprising a first conductivity type buffer layer, a first conductivity type cladding layer, a quantum well active layer, and a second conductivity type cladding layer and having a stripe geometry used for carrier injection, with the quantum well active layers in the vicinity of the cavity facets being disordered by impurity diffusion,
wherein the first and second conductivity type cladding layers in the first infrared semiconductor laser and the second red semiconductor laser arc composed of an AlGaInP material,
the active lever of the first infrared semiconductor laser is composed of an AlGaAs material including GaAs and the active layer of the second red semiconductor laser is composed of an AlGaInP material including InGaP,
the buffer lever is composed of an AlGaAs material,
the impurity is Zn,
the cladding layers have a concentration of p-type impurity of 1×1018 cm−3 or higher at a portion that is rendered p-type from n-type by impurity diffusion in the vicinity of the cavity facets,
the AlGaAs materials composing the buffer layers of the first infrared semiconductor laser and the second red semiconductor laser satisfy the relationships expressed by the formulas,
X1≧0, X2>0.37, and X2≧X1
where X1 is defined as a compositional ratio of A1 in the first infrared semiconductor laser and X2 as a compositional ratio of A1 in the second red semiconductor laser,
relationships expressed by the following formulas arc satisfied,
λ1>λb1, λ2>λb2, λ1>λ2, and E1<E2
where λ1 is defined as an emission wavelength of an active layer of the first infrared semiconductor laser, λ2 as an emission wavelength of the second red semiconductor laser, E1 as a band gap energy of the buffer layer in the first infrared semiconductor laser, E2 as a band gap energy of the buffer layer in the second red semiconductor laser, λb1 as a wavelength corresponding to the band gap energy of the buffer layer in the first semiconductor infrared laser, and λb2 as a wavelength corresponding to the band gap energy of the buffer layer in the second red semiconductor laser, and
a thermal history imparted to the first infrared semiconductor laser is longer than a thermal history imparted to the second red semiconductor laser.

### Claim 2 (depends on 1)

The two-wavelength semiconductor laser device according to claim 1, wherein the relationship expressed by the formula, E1>E2, is satisfied.