# US 7,612,867 B2 · Lithographic apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 7,612,867 B2 - Document ID: US7612867B2 - Status: Granted - Kind: B2 - Application number: 12/222,483 - Filed: 2008-08-11 - Published: 2009-01-01 - Granted: 2009-11-03 - Earliest claimed: 2003-05-28 - Assignees: ASML Netherlands B.V. - Inventors: Gerard Van Schothorst; Fransiscus Hendrikus Van Deuren; Jan Van Eijk; Erik Roelof Loopstra; Robert-Han Munnig Schmidt; Felix Godfried Peter Peeters - Web page: https://patentgrep.com/patent/US7612867B2 ## CPC - G03F 7/70066: {Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds} - G03F 7/70191: {Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus. ## Claims ### Claim 1 A lithographic apparatus, comprising: an illumination system configured to condition a beam of radiation; a support configured to support a patterning device that imparts a desired pattern to the beam of radiation; a substrate holder configured to hold a substrate; and a projection system configured to project the patterned beam onto a target portion of the substrate; and a spatial filter configured to selectively obstruct a portion of the patterned beam; wherein the spatial filter comprises a first pair and a second pair of spatial filtering structures disposed in a path of the projection beam, wherein the first pair of spatial filtering structures are disposed at a predetermined distance from each other along a direction and the second pair of spatial filtering structures are disposed at a predetermined distance from each other in the same direction, and wherein the second pair of spatial filtering structures are arranged to move with respect to the first pair of spatial filtering structures so as to cause the projection beam to scan in the same direction. ### Claim 2 (depends on 1) The lithographic apparatus of claim 1, wherein the first and second spatial filtering structures comprise blades. ### Claim 3 (depends on 2) The lithographic apparatus of claim 2, wherein the blades are moveable. ### Claim 4 (depends on 3) The lithographic apparatus of claim 3, wherein the movable blades are arranged to move together and further apart along the Y-direction. ### Claim 5 (depends on 4) The lithographic apparatus of claim 4, wherein the blades of the first pair of spatial filtering structures arranged to move together and apart in the Y-direction are coupled to the support structure. ### Claim 6 (depends on 4) The lithographic apparatus of claim 4, wherein the blades of the first pair of spatial filtering structures arranged to move together and further apart along the Y-direction are coupled to, and additionally each arranged to move in the Y-direction relative to, a frame of the lithographic projection apparatus. ### Claim 7 (depends on 1) The lithographic apparatus of claim 1, wherein the predetermined distance between the first pair of spatial filtering structures defines a scanning length. ### Claim 8 (depends on 1) The lithographic apparatus of claim 1, wherein the predetermined distance between the second pair of spatial filtering structures defines a scanning slit width. ### Claim 9 (depends on 1) The lithographic apparatus of claim 1, wherein the second pair of spatial filtering structures are disposed downstream of the first pair of spatial filtering structures in a direction of projection of the beam of radiation. ### Claim 10 (depends on 1) The lithographic apparatus of claim 1, wherein the illumination system causes the beam of radiation to be focused at a predetermined focal plane and the first and second pair of spatial filtering structures are disposed in a region of the focal plane. ### Claim 11 (depends on 1) The lithographic apparatus of claim 1, wherein the first and second pair of spatial filtering structures are disposed proximate to the support structure. ### Claim 12 (depends on 11) The lithographic apparatus of claim 11, wherein the first pair of spatial filtering structures is disposed between the illumination system and the support structure. ### Claim 13 (depends on 11) The lithographic apparatus of claim 11, wherein the first pair of spatial filtering structures is disposed between the support structure and the projection system. ### Claim 14 (depends on 1) The lithographic apparatus of claim 1, wherein the distance between the first and second pair of spatial filtering structures, respectively, and the relative movement between the first and second spatial filtering structures allow a predetermined scanning profile to be performed. ### Claim 15 (depends on 1) The lithographic apparatus of claim 1, wherein said beam of radiation comprises EUV radiation having a wavelength less than approximately 50 nm. ### Claim 16 (depends on 1) The lithographic apparatus of claim 1, wherein said beam of radiation comprises EUV radiation having a wavelength from approximately 8 nm to approximately 16 nm. ### Claim 17 A device manufacturing method, comprising: providing a substrate that is at least partially covered by a layer of radiation-sensitive material; conditioning a beam of radiation using an illumination system; providing a support configured to support a patterning device; configuring the beam of radiation with a desired pattern in its cross-section based on the patterning device; projecting the patterned beam of radiation onto a target area of the layer of radiation-sensitive material; and selectively obstructing a portion of the patterned beam via a spatial filter, said selectively obstructing a portion of the patterned beam including: employing a first and a second pair of spatial filtering structures disposed in a path of the patterned beam of radiation; positioning the first pair of spatial filtering structures at a predetermined distance from each other in a direction; positioning the second pair of spatial filtering structures at a predetermined distance from each other in the same direction, and moving the second pair of spatial filtering structures with respect to the first pair of spatial filtering structures in order to cause the patterned beam to scan along the same direction.