# US 7,612,834 B2 · Parallax barrier, multiple display device and parallax barrier manufacturing method

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- Number: US 7,612,834 B2
- Document ID: US7612834B2
- Status: Granted
- Kind: B2
- Application number: 11/995,146
- Filed: 2006-06-26
- Published: 2009-03-26
- Granted: 2009-11-03
- Earliest claimed: 2005-07-25
- Assignees: Sharp Kabushiki Kaisha
- Inventors: Kazunori Tanimoto; Tatsuji Saitoh
- Web page: https://patentgrep.com/patent/US7612834B2

## CPC

- G02B 30/27: involving lenticular arrays
- G02B 30/30: involving parallax barriers
- H04N 13/31: using parallax barriers
- H04N 2013/403: {the images being monoscopic}
- H04N 2213/001: Constructional or mechanical details
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- H04N: PICTORIAL COMMUNICATION, e.g. TELEVISION

## Abstract

A parallax barrier is manufactured by forming a light-blocking layer by patterning a metal layer or a resin layer on a barrier glass in a photolithography step. On a mask used in the photolithography step, some pitches between slits are different, the slits corresponding to portions whereupon the light-blocking layers are to be formed. In addition, on the mask, first pitches (for instance, 100) and second pitches (for instance 99.5), which can be actually formed with accuracy, are formed in a cycle, and the average of such pitches can be accord with a theoretical pitch distance (for instance, 99.99). Thus, in the parallax barrier to be used for a multiple display device, visibility of the entire screen can be improved, and the parallax barrier which can be manufactured by using the mask lithography technology having a limited accuracy, and a method for manufacturing such parallax barrier are provided.

## Claims

### Claim 1

A parallax barrier for use in combination with a display panel and for permitting different images to be displayed respectively to different display directions of the display panel, the parallax barrier comprising:
a light-blocking layer on a transparent substrate, the light-blocking layer having a repeated pattern arranged at pitches; wherein
some of the pitches are different from others of the pitches.

### Claim 2 (depends on 1)

The parallax barrier as set forth in claim 1, wherein the repeated pattern of the light-blocking layer includes first pitches and second pitches which are arranged in a certain cycle.

### Claim 3 (depends on 1)

The parallax barrier as set forth in claim 1, wherein the repeated pattern of the light-blocking layer includes different kinds of pitches, which are randomly positioned.

### Claim 4

A multiple display device comprising:
a matrix-type image-producing device arranged to generate a display image; and
a parallax barrier attached with the matrix-type image-producing device arranged to permit different images to be displayed respectively to different display directions of the matrix-type image-producing device; wherein
the parallax barrier includes a light blocking layer on a transparent substrate, the light-blocking layer having a repeated pattern of pitches, some of the pitches being different from other pitches, and an average pitch distance of which is different from a pixel pitch distance of the matrix-type image-producing device.

### Claim 5 (depends on 4)

The multiple display device as set forth in claim 4, wherein the repeated pattern of the light-blocking layer includes first pitches and second pitches positioned in a certain cycle.

### Claim 6 (depends on 4)

The multiple display device as set forth in claim 4, wherein the repeated pattern of the light-blocking layer includes different kinds of pitches, which are randomly positioned.

### Claim 7

A method of manufacturing a parallax barrier for use in combination with a display panel and for permitting different images to be displayed respectively to different display directions of the display panel, the method comprising the steps of:
forming a light-blocking layer on a transparent substrate, the light-blocking layer having a repeated pattern; wherein
the step of forming the light-blocking layer includes performing photolithography to pattern a metal layer or a resin layer formed on the transparent substrate; and
the step of performing the photolithography includes using a mask having a repeated pattern of slits arranged at pitches, some of the pitches being different from other pitches, the slits corresponding to portions where the light-blocking layer is to be formed.