# US 7,612,373 B2 · Liquid crystal display device and method of manufacturing liquid crystal display device with color filter layer on thin film transistor

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- Number: US 7,612,373 B2
- Document ID: US7612373B2
- Status: Granted
- Kind: B2
- Application number: 11/169,021
- Filed: 2005-06-29
- Published: 2006-01-12
- Granted: 2009-11-03
- Earliest claimed: 2004-06-30
- Assignees: LG Display Co., Ltd.
- Inventors: Jong-Jin Park
- Web page: https://patentgrep.com/patent/US7612373B2

## CPC

- H10D 86/0231: {using masks, e.g. half-tone masks}
- G02F 1/13458: {Terminal pads}
- G02F 1/136209: {Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element}
- H10D 86/40: characterised by multiple TFTs
- H10D 86/441: {Interconnections, e.g. scanning lines}
- H10D 86/60: wherein the TFTs are in active matrices
- G02F 1/136222: {Colour filters incorporated in the active matrix substrate}
- G02F 1/136227: {Through-hole connection of the pixel electrode to the active element through an insulation layer}
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS

## Abstract

A method of fabricating a liquid crystal display device is provided. The method of fabricating a liquid crystal display device includes forming a thin film transistor including a source electrode and a drain electrode on a substrate, forming a first passivation layer on the substrate, forming a black matrix on the first passivation layer, forming a color filter layer on the first passivation layer in the pixel region, and forming a pixel electrode above the color filter layer and the black matrix by using a single mask.

## Claims

### Claim 1

A liquid crystal display device, comprising:
a substrate;
a gate line and a gate electrode on the substrate;
a gate insulating layer on the gate line and the gate electrode;
an active layer on the gate insulating layer over the gate electrode;
an ohmic contact layer on the active layer;
a source electrode, a drain electrode and a data line on the ohmic contact layer, the data line crossing the gate line to define a pixel region;
a first passivation layer on the source and drain electrodes and the data line;
a black matrix on the first passivation layer over the active layer;
a color filter layer on the first passivation layer in the pixel region;
a second passivation layer on the black matrix and the color filter layer, the second passivation layer exposing the color filter layer in the pixel region; and
a pixel electrode on the exposed color filter layer in the pixel region, the pixel electrode connected to the drain electrode, wherein the pixel electrode is disposed in a region excluding the second passivation layer such that the pixel electrode does not overlap the second passivation layer.

### Claim 2 (depends on 1)

The device according to claim 1, wherein the pixel electrode is disposed on a same layer as the second passivation layer.

### Claim 3 (depends on 1)

The device according to claim 1, further comprising a columnar spacer over the gate and data lines.

### Claim 4 (depends on 1)

The device according to claim 1, wherein the second passivation layer is selectively patterned in the pixel region and selectively exposes the color filter layer.

### Claim 5 (depends on 4)

The device according to claim 4, further comprising a common electrode on the selectively exposed color filter layer in the pixel region, the common electrode spaced apart from and coplanar with the pixel electrode.