# US 7,611,949 B2 · Method of fabricating metal-oxide-semiconductor transistor

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- Number: US 7,611,949 B2
- Document ID: US7611949B2
- Status: Granted
- Kind: B2
- Application number: 11/309,205
- Filed: 2006-07-13
- Published: 2007-11-08
- Granted: 2009-11-03
- Earliest claimed: 2006-05-05
- Assignees: ProMOS Technologies Inc.
- Inventors: San-Jung Chang; Jim Lin
- Web page: https://patentgrep.com/patent/US7611949B2

## CPC

- H10D 64/516: {the thicknesses being non-uniform}
- H10D 64/018: {Spacers formed inside holes at the prospective gate locations, e.g. holes left by removing dummy gates}
- H10D 64/027: {by etching at gate locations}
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES

## Abstract

A method of fabricating a metal-oxide-semiconductor (MOS) transistor is provided. First, a patterned hard mask layer with an opening therein is formed over the substrate. A spacer is formed on the sidewall of the patterned hard mask layer in the opening. An isotropic etching process is performed on the substrate to form a recess in the substrate. An ion implant process is performed on the substrate in the lower portion of the recess using oxidation-restrained ions. The spacer is removed. Then, a thermal process is performed to form a gate oxide layer on the surface of the substrate within the recess such that the gate oxide layer in the upper portion of the recess is thicker than that in the lower portion of the recess.

## Claims

### Claim 1

A method of fabricating a metal-oxide-semiconductor transistor, comprising:
forming a patterned hard mask layer on a substrate, wherein the patterned hard mask layer has an opening formed therein;
forming a spacer on a sidewall of the patterned hard mask layer in the opening;
using the patterned hard mask layer and the spacer as a mask, performing an isotropic etching process on the substrate to form a recess in the substrate, wherein the recess includes an upper portion and a lower portion;
using the patterned hard mask layer and the spacer as a mask, performing an ion implant process using oxygen-restrained ions on the substrate in the lower portion of the recess;
removing the spacer; and
performing a thermal oxidation process to form a gate oxide layer on a surface of the substrate within the recess such that a thickness of the gate oxide layer in the upper portion of the recess is greater than that of the gate oxide layer in the lower portion of the recess.

### Claim 2 (depends on 1)

The method of claim 1, wherein the ion implant process comprises a tilted ion implant process.

### Claim 3 (depends on 1)

The method of claim 1, wherein the oxygen-restrained ions comprise nitrogen ions.

### Claim 4 (depends on 1)

The method of claim 1, further comprises:
forming a gate over the gate oxide layer, wherein the gate protrudes above the recess;
removing the patterned hard mask layer; and
forming a source/drain region in the substrate on a side of the gate.

### Claim 5 (depends on 4)

The method of claim 4, wherein the method of forming the gate comprises:
before removing the patterned hard mask layer, forming a conductive layer over the substrate to fill the recess and the opening; and
removing the conductive layer outside the opening.

### Claim 6 (depends on 5)

The method of claim 5, wherein the method of removing the conductive layer outside the opening comprises performing a chemical-mechanical polishing process.

### Claim 7 (depends on 4)

The method of claim 4, wherein the method of forming the gate comprises:
after removing the patterned hard mask layer, forming a conductive layer over the substrate to fill the recess; and
removing the conductive layer not right over the recess.

### Claim 8 (depends on 1)

The method of claim 1, further comprising before forming the patterned hard mask layer, forming a pad oxide layer on the substrate.

### Claim 9 (depends on 1)

The method of claim 1, further comprising before performing the ion implant process on the substrate, forming a sacrificial oxide layer on the substrate within the recess, and after performing the ion implant process, removing the sacrificial oxide layer.

### Claim 10

A method of fabricating a metal-oxide-semiconductor transistor, comprising:
forming a patterned hard mask layer over a substrate, wherein the patterned hard mask layer has an opening formed therein;
forming a spacer on a sidewall of the patterned hard mask layer in the opening;
using the patterned hard mask layer and the spacer as a mask, performing an anisotropic etching process on the substrate to remove a portion of the substrate in the opening;
using the patterned hard mask layer and the spacer as a mask, performing an isotropic etching process on the substrate to form a recess in the substrate in the opening;
using the patterned hard mask layer and the spacer as a mask, performing an ion implant process on the substrate in a lower portion of the recess using oxygen-restrained ions;
removing the spacer; and
performing a thermal oxidation process to form a gate oxide layer on a surface of the substrate within the recess such that a thickness of the gate oxide layer in an upper portion of the recess is greater than that of the gate oxide layer in the lower portion of the recess.

### Claim 11 (depends on 10)

The method of claim 10, wherein the ion implant process comprises a tilted ion implant process.

### Claim 12 (depends on 10)

The method of claim 10, wherein the oxygen-restrained ions comprise nitrogen ions.

### Claim 13 (depends on 10)

The method of claim 10, further comprising:
forming a gate on the gate oxide layer, wherein the gate protrudes above the recess;
removing the patterned hard mask layer; and
forming a source/drain region in the substrate on a side of the gate.

### Claim 14 (depends on 13)

The method of claim 13, wherein the method of forming the gate comprises:
before removing the patterned hard mask layer, forming a conductive layer over the substrate to fill the recess and the opening; and
removing the conductive layer outside the opening.

### Claim 15 (depends on 14)

The method of claim 14, wherein the method of removing the conductive layer outside the opening comprises performing a chemical-mechanical polishing process.

### Claim 16 (depends on 13)

The method of claim 13, wherein the method of forming the gate comprises:
after removing the patterned hard mask layer, forming a conductive layer over the substrate to fill the recess; and
removing the conductive layer not right over the recess.

### Claim 17 (depends on 10)

The method of claim 10, further comprising before forming the patterned hard mask layer, forming a pad oxide layer on the substrate.

### Claim 18 (depends on 10)

The method of claim 10, further comprising before performing the ion implant process on the substrate, forming a sacrificial oxide layer on the substrate within the recess, and after performing the ion implant process, removing the sacrificial oxide layer.