# US 7,611,810 B2 · Charged beam processing apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 7,611,810 B2 - Document ID: US7611810B2 - Status: Granted - Kind: B2 - Application number: 11/678,244 - Filed: 2007-02-23 - Published: 2008-03-20 - Granted: 2009-11-03 - Earliest claimed: 2006-02-28 - Assignees: Canon Kabushiki Kaisha - Inventors: Masahiko Okunuki; Haruhito Ono; Shinan Wang; Kenji Tamamori - Web page: https://patentgrep.com/patent/US7611810B2 ## CPC - H01J 37/3056: {for microworking, e. g. etching of gratings or trimming of electrical components} - B82Y 10/00: Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic - B82Y 40/00: Manufacture or treatment of nanostructures - C23C 16/047: {using irradiation by energy or particles} - H01J 37/3174: {Particle-beam lithography, e.g. electron beam lithography} - H01J 2237/0435: Multi-aperture - H01J 2237/31732: Depositing thin layers on selected microareas - H01J 2237/31744: introducing gas in vicinity of workpiece - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract A charged beam processing apparatus for processing an object to form structures on the object includes a processing chamber, a multi-charged beam optical system configured to generate a plurality of charged beams, and to converge and to deflect the plurality of charged beams to irradiate the object in the processing chamber with the plurality of charged beams, and a supply port configured to supply a gas into the processing chamber. The multi-charged beam optical system includes (i) a lens array, and (ii) a pattern forming plate configured to select a portion of the lens array to be used to form the structures. The charged beam processing apparatus includes a controller configured to control an exchange of the pattern forming plate in accordance with an arrangement pattern of the structures to be formed on the object. ## Claims ### Claim 1 A charged beam processing apparatus for processing an object to form structures on the object, the apparatus including a processing chamber, a multi-charged beam optical system configured to generate a plurality of charged beams, and to converge and to deflect the plurality of charged beams to irradiate the object in the processing chamber with the plurality of charged beams, and a supply port configured to supply a gas into the processing chamber, the multi-charged beam optical system comprising: (i) a lens array; and (ii) a pattern forming plate configured to select a portion of the lens array to be used to form the structures; and the charged beam processing apparatus comprising: a controller configured to control an exchange of the pattern forming plate in accordance with an arrangement pattern of the structures to be formed on the object. ### Claim 2 (depends on 1) An apparatus according to claim 1, wherein the controller is further configured to control an exchange of the lens array in accordance with an arrangement period of the structures to be formed on the object. ### Claim 3 (depends on 1) An apparatus according to claim 1, wherein the pattern forming plate is configured to shield a charged beam not to enter a portion of the lens array. ### Claim 4 (depends on 1) An apparatus according to claim 1, wherein the supply port is configured to supply a gas for material deposition on the object or etching of the object. ### Claim 5 (depends on 1) An apparatus according to claim 1, wherein the apparatus is configured to process the object to form a photonic crystal. ### Claim 6 (depends on 1) The apparatus according to claim 1, wherein the apparatus is configured to process the object to form a field emitter array. ### Claim 7 (depends on 1) A method of manufacturing a device, the method comprising: processing an object to form structures on the object using a charged beam processing apparatus according to claim 1.