# US 7,611,646 B2 · Oxide sintered body and an oxide film obtained by using it, and a transparent base material containing it

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- Number: US 7,611,646 B2
- Document ID: US7611646B2
- Status: Granted
- Kind: B2
- Application number: 11/604,259
- Filed: 2006-11-27
- Published: 2007-08-09
- Granted: 2009-11-03
- Earliest claimed: 2006-02-08
- Assignees: Sumitomo Metal Mining Co., Ltd.
- Inventors: Tokuyuki Nakayama; Yoshiyuki Abe
- Web page: https://patentgrep.com/patent/US7611646B2

## CPC

- C23C 14/3414: {Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy}
- C03C 17/3417: {all coatings being oxide coatings}
- C03C 17/3435: {comprising a nitride, oxynitride, boronitride or carbonitride}
- C03C 17/3441: {comprising carbon, a carbide or oxycarbide}
- C04B 35/01: based on oxide ceramics
- C04B 35/645: Pressure sintering
- C23C 14/086: {of zinc, germanium, cadmium, indium, tin, thallium or bismuth}
- C03C 2217/23: Mixtures
- C03C 2218/154: by sputtering
- C03C 2218/365: Coating different sides of a glass substrate
- C04B 2235/3286: Gallium oxides, gallates, indium oxides, indates, thallium oxides, thallates or oxide forming salts thereof, e.g. zinc gallate
- C04B 2235/656: characterised by specific heating conditions during heat treatment
- C04B 2235/658: Atmosphere during thermal treatment
- C04B 2235/77: Density
- C04B 2235/80: Phases present in the sintered or melt-cast ceramic products other than the main phase
- Y10T 428/265: 1 mil or less
- Y10T 428/30: Self-sustaining carbon mass or layer with impregnant or other layer
- Y10T 428/31507: Of polycarbonate
- Y10T 428/31616: Next to polyester [e.g., alkyd]
- Y10T 428/31645: Next to addition polymer from unsaturated monomers
- Y10T 428/31667: Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
- Y10T 428/31786: Of polyester [e.g., alkyd, etc.]
- Y10T 428/31938: Polymer of monoethylenically unsaturated hydrocarbon
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- C03C: CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C04B: LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE {(roofing granules E04D7/005)}; CERAMICS (devitrified glass-ceramics C03C10/00); REFRACTORIES; TREATMENT OF NATURAL STONE
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

The oxide sintered body mainly consists of gallium, indium, and oxygen, and a content of the gallium is more than 65 at. % and less than 100 at. % with respect to all metallic elements, and the density of the sintered body is 5.0 g/cm3 or more. The oxide film is obtained using the oxide sintered body as a sputtering target, and the shortest wavelength of the light where the light transmittance of the film itself except the substrate becomes 50% is 320 nm or less. The transparent base material is obtained by forming the oxide film on one surface or both surfaces of a glass plate, a quartz plate, a resin plate or resin film where one surface or both surfaces are covered by a gas barrier film, or on one surface or both surfaces of a transparent plate selected from a resin plate or a resin film where the gas barrier film is inserted in the inside.

## Claims

### Claim 1

An oxide sintered body consisting essentially of gallium, indium, and oxygen, such that:
a content of the gallium is more than 65 at. % and less than 100 at. % with respect to all metallic elements;
the oxide sintered body having one or more phases selected from a gallium oxide phase having β-Ga2O3 type structure (β-Ga2O3 phase), a gallium indium oxide phase having β-Ga2O3 type structure (β-GaInO3 phase), or (Ga, In)2O3 phase;
the oxide sintered body having an indium oxide phase (In2O3 phase) of bixbyite-type structure; and
a density of the sintered body is 5.0 g/cm3 or more,
wherein a film can be formed by a direct current sputtering method when the oxide sintered body is used as a sputtering target, and
wherein a ratio in which the indium oxide phase (In2O3 phase) of the bixbyite-type structure contained is 5% or less in terms of an X-ray diffraction peak intensity ratio defined by the following formula (1):
In2O3 phase (400)/{β-Ga2O3 phase (−202)+β-GaInO3 phase (111)+(Ga,In)2O3 phase (2θ≈33°)}×100 [%] (1).

### Claim 2 (depends on 1)

The oxide sintered body according to claim 1, wherein a content of the gallium is more than 65 at. % and 90 at. % or less with respect to all metallic elements, and a density of the sintered body is 5.5 g/cm3 or more.

### Claim 3 (depends on 1, 2)

The oxide sintered body according to claim 1 or 2, which is sintered by a hot pressing method under conditions where a sintering temperature is from 800° C.˜1000° C. and a sintering pressure is from 4.9 MPa˜29.4 MPa in an inert gas atmosphere, and a metal indium phase is not contained.