Imprint lithography
AssigneeASML Netherlands B.V.
InventorsHelmar Van Santen, Aleksey Yurievich Kolesnychenko
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Abstract
An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template and a substrate table, the template holder having a gas bearing configured to supply gas via a high pressure channel and to control a separation distance between the imprint template and a substrate held on the substrate table.
Claims19
An imprint lithography apparatus comprising a template holder configured to hold an imprint template and a substrate table, the template holder having a gas bearing configured to supply gas via a high pressure channel and to control a separation distance between the imprint template and a substrate held on the substrate table.
A template holder configured to hold an imprint lithography template, the template holder comprising a gas bearing arranged to supply gas via a high pressure channel and to control a separation distance between the imprint template and a substrate held on a substrate table.
An imprint lithography apparatus comprising:
- a substrate table;
- and
- a template holder configured to hold an imprint template, the template holder having a gas bearing configured to supply gas via a high pressure channel and to control a separation distance between the imprint template and a substrate held on the substrate table, and the template holder having an opening adjacent to the template when held by the template holder or between the template holder and the template when held by the template holder, the opening configured to remove or supply gas to allow for adjustment of pressure beneath the template.
Dependencies are inferred from the claim text.