# US 7,610,574 B2 · Method and apparatus for designing fine pattern

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- Number: US 7,610,574 B2
- Document ID: US7610574B2
- Status: Granted
- Kind: B2
- Application number: 11/590,399
- Filed: 2006-10-31
- Published: 2008-04-03
- Granted: 2009-10-27
- Earliest claimed: 2006-10-02
- Assignees: Samsung Electronics Co., Ltd.
- Inventors: Jae-pil Shin; Young-ile Kim; Moon-hyun Yoo; Jong-bae Lee
- Web page: https://patentgrep.com/patent/US7610574B2

## CPC

- G03F 1/36: Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

Provided are a method and apparatus for designing a fine pattern that can be entirely transferred onto an object. The method includes reading the original data of a fine pattern for exposure. The fine pattern is divided into a first pattern not requiring revision and a second pattern requiring revision. The fine pattern is revised by forming an auxiliary pattern maintaining a first distance D1 from the second pattern. A fine pattern to be transferred onto a target object is estimated by running an emulation program including a first auxiliary pattern and a second auxiliary pattern. The estimated fine pattern is compared to the original data of the fine pattern for exposure, and the revised fine pattern is designated as a final fine pattern if there is no difference between the estimated fine pattern and the original data of the fine pattern for exposure.

## Claims

### Claim 1

A method of designing a fine pattern, comprising:
reading original data of a fine pattern for exposure;
dividing the fine pattern into a first pattern not requiring revision and a second pattern requiring revision;
correcting the fine pattern by forming an auxiliary pattern maintaining a first distance D1 from the second pattern such that a revised fine pattern is formed;
estimating a fine pattern to be transferred to a target object by running an emulation program using an emulating device for emulation of the revised fine pattern including the auxiliary pattern; and
comparing the estimated fine pattern to the original data of the fine pattern for exposure, and designating the revised fine pattern as a final fine pattern if there is no difference between the estimated fine pattern and the original data of the fine pattern for exposure.

### Claim 2 (depends on 1)

The method of claim 1, wherein the dividing the fine pattern comprises:
selecting from a plurality of multi-angled fine patterns a selected multi-angled fine pattern to be divided into the first and second patterns;
determining a connecting portion for dividing the selected multi-angled fine pattern into quadrangular shapes; and
obtaining the divided first and second patterns by removing the connecting portion.

### Claim 3 (depends on 2)

The method of claim 2, further comprising, after the dividing the fine pattern, checking whether the dividing the fine pattern into the first and second patterns has been properly performed; and
reselecting the multi-angled fine pattern to be divided into the first and second patterns if the dividing the fine pattern into the first and second patterns has not been properly performed.

### Claim 4 (depends on 2)

The method of claim 2, further comprising, after the dividing the fine pattern into the first and second patterns:
checking whether the dividing the fine pattern into the first and second patterns has been properly performed; and
reattaching the connecting portion if the dividing has been properly performed.

### Claim 5 (depends on 2)

The method of claim 2, further comprising, after the dividing the fine pattern into the first and second patterns:
determining whether the first and second patterns obtained can be formed through photo etching; and
reselecting a multi-angled fine pattern to be divided into the first and second patterns if it is determined that the first and second patterns obtained cannot be formed through the photo etching.

### Claim 6 (depends on 1)

The method of claim 1, wherein, in the forming an auxiliary pattern, the auxiliary pattern includes a first auxiliary pattern that is independently formed to maintain the first distance D1 from the second pattern which has a width W1.

### Claim 7 (depends on 6)

The method of claim 6, wherein portions of the first auxiliary pattern are separated by a distance of(W1+2×D1).

### Claim 8 (depends on 6)

The method of claim 6, wherein the first auxiliary pattern is separated by the first distance D1 from the second pattern along a perimeter of the second pattern that is linear.

### Claim 9 (depends on 6)

The method of claim 6, wherein the first auxiliary pattern has a width W2 that is the same as the width W1 of the second pattern.

### Claim 10 (depends on 1)

The method of claim 1, wherein, in the forming an auxiliary pattern, the auxiliary pattern includes a second auxiliary pattern attached to the first pattern and maintaining the first distance D1 from the first pattern.

### Claim 11 (depends on 10)

The method of claim 10, wherein the second auxiliary pattern is separated by the first distance D1 from at least one side of the second pattern that is linear.

### Claim 12 (depends on 10)

The method of claim 10, wherein the second auxiliary pattern has a width W3 that is less than a width W1 of the second pattern.

### Claim 13 (depends on 1)

The method of claim 1, further comprising forming a trimming pattern for removing an unnecessary material between first and second auxiliary patterns after the forming an auxiliary pattern, wherein, in the forming an auxiliary pattern, the auxiliary pattern includes the first auxiliary pattern and the second auxiliary pattern.

### Claim 14 (depends on 13)

The method of claim 13, wherein the unnecessary material removed by the trimming pattern is a residual material of an etching process.

### Claim 15 (depends on 13)

The method of claim 13, after the estimating a fine pattern, further comprising:
checking whether there is a notch in the second pattern; and
reforming the auxiliary pattern if there is a notch in the second pattern.

### Claim 16

An apparatus for designing a fine pattern, comprising:
a reading member for reading original data of a fine pattern for exposure;
a dividing member for dividing the fine pattern into a first pattern not requiring revision and a second pattern requiring revision;
a revising member for revising the fine pattern by forming an auxiliary pattern maintaining a first distance D1 from the second pattern such that a revised fine pattern is formed;
an estimating member for estimating a fine pattern to be transferred to a target object by running a program for emulation of the revised fine pattern including the auxiliary pattern; and
a determining member for comparing the estimated fine pattern to the original data, and designating the revised fine pattern as a final fine pattern if there is no difference between the estimated fine pattern and the original data of the fine pattern for exposure.

### Claim 17 (depends on 16)

The apparatus of claim 16, wherein, in the forming an auxiliary pattern, the auxiliary pattern includes a first auxiliary pattern that is independently formed to maintain the first distance D1 from the second pattern which has a width W1.

### Claim 18 (depends on 16)

The apparatus of claim 16, wherein, in the forming an auxiliary pattern, the auxiliary pattern includes a second auxiliary pattern attached to the first pattern and separated by the first distance D1 from the first pattern.

### Claim 19 (depends on 16)

The apparatus of claim 16, further comprising a member for forming a trimming pattern to aid removal of an unnecessary material formed between first and the second auxiliary patterns, after the forming an auxiliary pattern, wherein the auxiliary pattern includes the first auxiliary pattern and the second auxiliary pattern.