# US 7,609,434 B2 · Method for manufacturing electrode for electrochromic display

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- Number: US 7,609,434 B2
- Document ID: US7609434B2
- Status: Granted
- Kind: B2
- Application number: 11/873,608
- Filed: 2007-10-17
- Published: 2008-12-25
- Granted: 2009-10-27
- Earliest claimed: 2007-06-20
- Assignees: Samsung Electronics Co., Ltd.
- Inventors: Hong Shik Shim; In Seo Kee; Ick Hwan Ko; Young Gu Lee
- Web page: https://patentgrep.com/patent/US7609434B2

## CPC

- G02F 1/155: Electrodes
- G02F 2001/1536: {additional, e.g. protective, layer inside the cell}
- Y10T 29/53204: Electrode
- G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

Disclosed is a method for manufacturing an electrode of an electrochromic display. The method includes, prior to forming a porous nanoelectrode, forming a barrier rib for separating an electrolyte using a photosensitive paste as a material for the barrier rib, in which the photosensitive paste enables formation of patterns through a photolithographic process and maintains its shape at 450° C. to 500° C. The use of the electrode enables fabrication of an electrochromic display that is capable of preventing cross-talk between pixels and has advantages of fast response speed, prolonged lifespan upon repeated use and improved electrochromism, when compared to the case of metal oxide electrodes.

## Claims

### Claim 1

A method for manufacturing an electrode of an electrochromic display comprising:
forming a wiring electrode on a substrate;
forming a barrier rib on the wiring electrode with the use of a photosensitive paste;
injecting an electrode-forming paste containing nanoparticles into the barrier rib;
sintering the barrier rib and the electrode-forming paste to form a nanoelectrode; and
coating an electrochromic material on the nanoparticle surfaces of the nanoelectrode;
wherein the photosensitive paste comprises: 20 to 30% by weight of SiO2 or Al2O3 as inorganic particles; 15 to 25% by weight of a mixture of methyl acrylate and isobutyl acrylate as a photosensitive monomer; 25 to 35% by weight of a mixture of methyl acrylate and isobutyl acrylate as a photosensitive polymer; 15 to 25% by weight of a benzophenol-based compound as a photopolymerization initiator and ultraviolet absorber; and 3 to 5% by weight of 2,4,6-trimethylphenol as an additive including a photopolymerization inhibitor and plasticizer.

### Claim 2 (depends on 1)

The method according to claim 1, further comprising: sintering the barrier rib at a high temperature, after forming the barrier rib with the photosensitive paste.

### Claim 3 (depends on 1)

The method according to claim 1, wherein the barrier rib is formed through a photolithographic process.

### Claim 4 (depends on 1)

The method according to claim 1, wherein the photosensitive paste comprises inorganic particles and an organic ingredient containing a photosensitive compound.

### Claim 5 (depends on 1)

The method according to claim 1, wherein the photosensitive paste comprises: 26% by weight of SiO2 or Al2O3 as inorganic particles; 20% by weight of a mixture of methyl acrylate and isobutyl acrylate as a photosensitive monomer; 30% by weight of a mixture of methyl acrylate and isobutyl acrylate as a photosensitive polymer; 20% by weight of a benzophenol-based compound as a photopolymerization initiator and ultraviolet absorber; and 4% by weight of 2,4,6-trimethylphenol as an additive including a photopolymerization inhibitor and plasticizer.

### Claim 6 (depends on 1)

The method according to claim 1, wherein the glass transition temperature (Tc) and thermal softening temperature (Tg) of the photosensitive paste are in a range from 350 degrees Celsius to 600 degrees Celsius.

### Claim 7 (depends on 1)

The method according to claim 1, wherein the photosensitive paste exhibits insulating property after sintering.

### Claim 8 (depends on 1)

The method according to claim 1, wherein the paste containing nanoparticles is applied to the barrier rib by printing, solution spin coating or electrophoretic deposition.

### Claim 9 (depends on 1)

The method according to claim 1, wherein the electrode has a porous structure.

### Claim 10 (depends on 9)

The method according to claim 9, wherein the porous structure is formed by high-temperature sintering.

### Claim 11 (depends on 1)

The method according to claim 1, wherein the electrochromic material is selected from the group consisting of polyaniline, polypyrrole, polythiophene, viologen and a derivative thereof.

### Claim 12 (depends on 1)

The method according to claim 1, wherein the electrochromic material is coated on the nanoparticle surfaces by dip coating, spray coating or spin coating.

### Claim 13

An electrochromic display comprising:
a wiring electrode formed on a substrate;
a barrier rib formed on the wiring electrode;
a nanoelectrode having nanoparticle surfaces formed on the wiring electrode; and
an electrochromic material formed on the nanoparticle surfaces of the nanoelectrode;
wherein the electrochromic material is selected from the group consisting of polyaniline, polypyrrole, polythiophene, and derivatives thereof.

### Claim 14 (depends on 13)

The electrochromic display of claim 13, wherein the barrier rib comprises a sintered photosensitive paste having an insulating property.

### Claim 15 (depends on 13)

The electrochromic display of claim 13, wherein the wiring electrode has a porous structure.
