# US 7,608,528 B2 · Substrate cover, and charged particle beam writing apparatus and method

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 7,608,528 B2
- Document ID: US7608528B2
- Status: Granted
- Kind: B2
- Application number: 11/838,465
- Filed: 2007-08-14
- Published: 2008-03-06
- Granted: 2009-10-27
- Earliest claimed: 2006-09-01
- Assignees: NuFlare Technology, Inc.
- Inventors: Yuichi Tachikawa
- Web page: https://patentgrep.com/patent/US7608528B2

## CPC

- G21K 1/02: using diaphragms, collimators
- B82Y 10/00: Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
- B82Y 40/00: Manufacture or treatment of nanostructures
- G21K 5/04: with beam-forming means
- H01J 37/3174: {Particle-beam lithography, e.g. electron beam lithography}
- H01J 2237/2007: Holding mechanisms
- H01J 2237/24578: Spatial variables, e.g. position, distance
- G21K: HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)

## Abstract

A substrate cover includes a frame-like member configured to be placed on a substrate which is to be written using a charged particle beam, and to have an outer perimeter dimension larger than a perimeter end of the substrate and an inner perimeter dimension, being a border between the frame-like member and an inner opening portion, smaller than the perimeter end of the substrate, and a contact point part configured to be provided on an undersurface of the frame-like member, in order to be electrically connected to the substrate.

## Claims

### Claim 1

A substrate cover comprising:
a frame-like member configured to be placed on a substrate which is to be written using a charged particle beam, and to have an outer perimeter dimension larger than a perimeter end of the substrate and an inner perimeter dimension, being a border between the frame-like member and an inner opening portion, smaller than the perimeter end of the substrate; and
a contact point part configured to be provided on an undersurface of the frame-like member, in order to be electrically connected to the substrate.

### Claim 2 (depends on 1)

The substrate cover according to claim 1, wherein the substrate cover includes a predetermined mark formed on the frame-like member.

### Claim 3 (depends on 1)

The substrate cover according to claim 1, wherein the substrate cover is formed of conductive material.

### Claim 4 (depends on 3)

The substrate cover according to claim 3, wherein the conductive material is metal material.

### Claim 5 (depends on 1)

The substrate cover according to claim 1, wherein the substrate cover is formed of insulating material and a surface thereof is coated with conductive material.

### Claim 6 (depends on 5)

The substrate cover according to claim 5, wherein the insulating material is ceramic material.

### Claim 7

A charged particle beam writing apparatus comprising:
a stage configured to hold thereon a substrate attached with a substrate cover covering a whole perimeter part of the substrate and including a contact point electrically connected to the substrate;
an electric conductive member configured to be electrically connected to the contact point and couple the substrate charged to ground potential, in a state that the substrate is arranged on the stage; and
a writing unit configured to write a predetermined pattern onto the substrate by using a charged particle beam, in a state that the substrate is coupled to ground potential by using the electric conductive member.

### Claim 8 (depends on 7)

The writing apparatus according to claim 7, wherein the substrate cover includes a frame-like member configured to have an outer perimeter dimension larger than a perimeter end of the substrate and an inner perimeter dimension, being a border between the frame-like member and an inner opening portion, smaller than the perimeter end of the substrate, wherein a predetermined mark is formed on an uppersurface of the frame-like part member.

### Claim 9

A charged particle beam writing method comprising:
carrying a substrate attached with a substrate cover with a predetermined mark formed thereon into a pattern writing apparatus;
checking a position of the substrate by using the predetermined mark formed on the substrate cover; and
writing a predetermined pattern on the substrate whose position has been checked, by using a charged particle beam.

### Claim 10

A charged particle beam writing method comprising:
carrying a substrate attached with a substrate cover that covers a whole perimeter part of the substrate into a pattern writing apparatus; and
writing a predetermined pattern on the substrate attached with the substrate cover, by using a charged particle beam.