# US 7,608,506 B2 · Body-contacted semiconductor structures and methods of fabricating such body-contacted semiconductor structures

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- Number: US 7,608,506 B2
- Document ID: US7608506B2
- Status: Granted
- Kind: B2
- Application number: 11/925,352
- Filed: 2007-10-26
- Published: 2008-02-21
- Granted: 2009-10-27
- Earliest claimed: 2005-08-31
- Assignees: International Business Machines Corporation
- Inventors: Kangguo Cheng; Louis Lu-Chen Hsu; Jack Allan Mandelman
- Web page: https://patentgrep.com/patent/US7608506B2

## CPC

- H10D 86/01: Manufacture or treatment
- H10B 12/395: {the transistor being vertical}
- H10D 86/201: {the substrates comprising an insulating layer on a semiconductor body, e.g. SOI (H10D86/40 take precedence)}
- H10D 89/213: {in field-effect devices}
- H10D 64/017: {using dummy gates in processes wherein at least parts of the final gates are self-aligned to the dummy gates, i.e. replacement gate processes}
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10B: ELECTRONIC MEMORY DEVICES

## Abstract

A semiconductor structure for a dynamic random access memory (DRAM) cell array that includes a plurality of vertical memory cells built on a semiconductor-on-insulator (SOI) wafer and a body contact in the buried dielectric layer of the SOI wafer. The body contact electrically couples a semiconductor body with a channel region of the access device of one vertical memory cell and a semiconductor substrate of the SOI wafer. The body contact provides a current leakage path that reduces the impact of floating body effects upon the vertical memory cell. The body contact may be formed by an ion implantation process that modifies the stoichiometry of a region of the buried dielectric layer so that the modified region becomes electrically conductive with a relatively high resistance.

## Claims

### Claim 1

A method for forming a semiconductor structure in a semiconductor wafer including a semiconductor substrate, a semiconductor layer including a semiconductor body, and a buried dielectric layer separating the semiconductor substrate from the semiconductor layer, the method comprising:
forming a first trench that extends through the semiconductor body and the buried dielectric layer into the semiconductor substrate;
building a first vertical memory cell in the first trench; and
implanting ions into a region of the buried dielectric layer to form a body contact that electrically couples the semiconductor body with the semiconductor substrate.

### Claim 2 (depends on 1)

The method of claim 1 wherein the buried dielectric layer is a buried oxide layer containing silicon and oxygen in a first stoichiometry, and implanting ions further comprises:
implanting silicon ions into the region of buried oxide layer to provide a second stoichiometry in the implanted region that differs from the first stoichiometry.

### Claim 3 (depends on 2)

The method of claim 2 wherein an implanted dose of silicon ions is sufficient to sufficient to provide a second stoichiometry including about 1 atomic percent to about 6 atomic percent of silicon in excess of the first stoichiometry of the buried oxide layer.

### Claim 4 (depends on 1)

The method of claim 1 further comprising:
forming a second trench that extends through the semiconductor body and the buried dielectric layer into the semiconductor substrate;
building a second vertical memory cell the second trench;
forming an insulating layer on the semiconductor body;
building a plurality of word lines on the semiconductor wafer including a first word line on the insulating layer between the first and second memory cells and electrically isolated from the first and second memory cells; and
removing a portion of the first word line to provide a body contact opening that exposes an area of the insulating layer overlying a region in the buried dielectric layer in which the body contact is subsequently formed.

### Claim 5 (depends on 4)

The method of claim 4 wherein the ions are implanted into the region in the buried dielectric layer through the body contact opening.

### Claim 6 (depends on 5)

The method of claim 5 wherein the implanted ions penetrate through the insulating layer area and an area of the semiconductor body registered vertically with the insulating layer area to reach the buried dielectric layer region.

### Claim 7 (depends on 6)

The method of claim 6 wherein implanting ions further comprises:
selecting a kinetic energy of the implanted ions such that the implanted ions stop predominantly in the buried dielectric layer underlying the removed portion of the first word line to define the body contact.

### Claim 8 (depends on 4)

The method of claim 4 wherein the word lines further include a second word line connected with an access device of the first vertical memory cell and a third word line connected with an access device of the second vertical memory cell, the second and third word lines electrically isolated from the first word line.

### Claim 9 (depends on 1)

The method of claim 1 wherein each of the vertical memory cells including a storage capacitor and an access device with a vertical channel defined in the semiconductor body and a gate configured to switch current flow through the vertical channel to the storage capacitor.