# US 7,608,369 B2 · Photomask to which phase shift is applied and exposure apparatus

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- Number: US 7,608,369 B2
- Document ID: US7608369B2
- Status: Granted
- Kind: B2
- Application number: 11/372,075
- Filed: 2006-03-10
- Published: 2006-09-21
- Granted: 2009-10-27
- Earliest claimed: 2005-03-18
- Assignees: Advanced LCD Technologies Development Center Co., Ltd.
- Inventors: Yukio Taniguchi
- Web page: https://patentgrep.com/patent/US7608369B2

## CPC

- G03F 1/30: Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof
- G03F 1/38: Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F 1/32: Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion,; Preparation thereof
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

A problem of a decrease in transmissive light, which partly occurs at a boundary between two polarization modulation regions of a polarized phase shift mask, is solved. A photomask for use in an exposure apparatus which forms an exposure pattern by illumination includes at least two polarization modulation regions which produce mutually incoherent polarized light components and adjoin each other, at least two phase modulation regions which impart a phase difference of 180° and adjoin each other, and amplitude modulation regions which decrease transmittance. A contact line between the polarization modulation regions and a contact line between the phase modulation regions are located at a corresponding position, and the amplitude modulation regions are provided on both sides of the common contact line, with a predetermined distance from the common contact line.

## Claims

### Claim 1

A photomask for use in an exposure apparatus which forms an exposure pattern by illumination, comprising:
a transparent mask substrate;
a polarization modulation layer provided on the mask substrate and including at least two polarization modulation regions which produce mutually incoherent polarized light components, have mutually different birefringence functions, and adjoin each other, a polarization modulation shift part being formed at a position where the at least two polarization modulation regions adjoin each other;
a phase modulation layer provided on one of the mask substrate and the polarization modulation layer and including at least two phase modulation regions which impart a phase difference of 180° and adjoin each other, a phase modulation shift part being formed at a position where the at least two phase modulation regions adjoin each other; and
an amplitude modulation layer provided on one of the mask substrate, the polarization modulation layer, and the phase modulation layer, and including amplitude modulation regions which decrease transmittance,
wherein a contact line between the at least two polarization modulation regions and a contact line between the at least two phase modulation regions are located at a corresponding position in a direction of illumination, thereby forming a dip part having a reduced light intensity of a transmissive light distribution, and the amplitude modulation regions are provided at positions apart from optical paths in the polarization modulation shift part and the phase modulation shift part by a predetermined distance, thereby relatively increasing the light intensity of the dip part.

### Claim 2 (depends on 1)

The photomask according to claim 1, wherein a transmittance of incident light of the amplitude modulation region is 50% or less.

### Claim 3 (depends on 1)

The photomask according to claim 1, wherein the two polarization modulation regions are formed of linear polarizers having mutually perpendicular axes in a plane of the polarization modulation regions.

### Claim 4 (depends on 3)

The photomask according to claim 3, wherein the two linear polarizers are linear polarizers composed of electrical conductor lattices having mutually perpendicular axes.

### Claim 5 (depends on 3)

The photomask according to claim 3, wherein the linear polarizer is composed of a structure having a photonic band gap with respect to a specific polarized light component.

### Claim 6 (depends on 1)

The photomask according to claim 1, wherein the two polarization modulation regions are formed of elements with mutually different birefringence functions.

### Claim 7 (depends on 6)

The photomask according to claim 6, wherein the elements with the birefringence functions have a phase difference of about 90° or about 180° between two polarized light components whose oscillation planes of electric vectors of light are perpendicular to each other.

### Claim 8 (depends on 1, 2, 3, 4, 5, 6, 7)

The photomask according to any one of claims 1 to 7, wherein when linearly polarized light or circularly polarized light is made incident on the two polarization modulation regions, mutually incoherent polarized lights are output from the two polarization modulation regions.