Back to results
US 7,605,908 B2Granted
Near-field exposure mask, near-field exposure apparatus, and near-field exposure method
AssigneeCanon Kabushiki Kaisha
InventorsToshiki Ito, Natsuhiko Mizutani
Life of this patent
Estimating the term…
Abstract
A near-field exposure mask includes a light blocking film having an opening smaller than a wavelength of exposure light, and a mask base material for holding the light blocking film. The near-field exposure mask is configured and positioned to effect exposure of an object to be exposed to near-field light generated corresponding to the opening during contact thereof with the object to be exposed. The mask base material is transparent to the exposure light and comprises a synthetic resin material having Young's modulus in a range of 1 GPa or more to 10 GPa or less.
Claims9
A near-field exposure mask comprising:
- a light blocking film having an opening smaller than a wavelength of exposure light;
- and
- a mask base material for holding said light blocking film,
- wherein said near-field exposure mask is configured and positioned to effect exposure of an object to be exposed to near-field light generated corresponding to the opening during contact thereof with the object to be exposed, and
- wherein said mask base material is transparent to the exposure light and comprises a synthetic resin material having Young's modulus in a range of 1 GPa or more to 10 GPa or less.
2 more elements
Dependencies are inferred from the claim text.