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US 7,605,857 B2Granted
Methods of manufacturing microlenses, microlens arrays and image sensors
AssigneeSamsung Electronics Co., Ltd.
InventorSae-Young Kim
Life of this patent
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Abstract
A method of manufacturing a microlens is provided. The method includes forming a first lens pattern, forming a second lens pattern on a portion of the first lens pattern in a manner which controls an asymmetric curvature of the microlens. The method further includes reflowing the first and second lens patterns.
Claims33
A method of manufacturing a microlens, comprising:
- forming a first lens pattern;
- forming a second lens pattern on a portion of the first lens pattern;
- and
- reflowing the first and second lens patterns in a manner which controls an asymmetric curvature of the microlens,
- wherein the reflowing of the first and second lens patterns comprises:
- heating the first and second lens patterns sequentially at about 140° C., at about 150° C., at about 160° C. and at about 170° C. respectively for about 5 minutes;
- and
- cooling the first and second lens patterns.
5 more elements
A method of manufacturing a microlens array having a plurality of microlenses, comprising:
- forming a first lens pattern array;
- forming a second lens pattern array on the first lens pattern array in a manner which controls an asymmetric curvature of each of the plurality of microlenses of the microlens array such that a microlens of the plurality of microlenses which is located farther from the center of the microlens array has a higher asymmetry of curvature than another microlens of the plurality of microlenses which is located nearer to the center of the microlens array, and such that a most convex portion of each microlens of the plurality of microlenses becomes farther from a center of the corresponding microlens according to a distance between the portion of the microlens of the plurality of microlenses and the center of the microlens array;
- and
- reflowing the first and second lens pattern arrays.
1 more element
A method of manufacturing an image sensor including a microlens array having a plurality of microlenses, the method comprising:
- forming a photo detector array on a semiconductor substrate;
- forming a first lens pattern array over the photo detector array;
- forming a second lens pattern array on the first lens pattern array;
- and
- reflowing the first and second lens pattern arrays in a manner which controls an asymmetric curvature of each of the plurality of microlenses of the microlens array,
- wherein a microlens of the plurality of microlenses which is located farther from the center of the microlens array has a higher asymmetry of curvature than another microlens of the plurality of microlenses located nearer to the center of the microlens array, and wherein a most convex portion of each microlens of the plurality of microlenses becomes farther from a center of the corresponding microlens according to a distance between the portion of the microlens of the plurality of microlenses and the center of the microlens array.
3 more elements
Dependencies are inferred from the claim text.