Bipolar high voltage/power semiconductor device having first and second insulated gated and method of operation
AssigneeCambridge Semiconductor Limited
InventorsFlorin Udrea, Nishad Udugampola, Gehan A. J. Amaratunga
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Abstract
A bipolar high voltage/power semiconductor device has a drift region having adjacent its ends regions of different conductivity types respectively. High and low voltage terminals are provided. A first insulated gate terminal and a second insulated gate terminal are also provided. One or more drive circuits provide appropriate voltages to the first and second insulated gate terminals so as to allow current conduction in a first direction or in a second direction that is opposite the first direction.
Claims19
A bipolar high voltage/power semiconductor device, the device comprising:
- a drift region of a first conductivity type and having first and second ends;
- the first end of the drift region having adjacent thereto a region of a second conductivity type which is adjacent a region of the first conductivity type, at least said region of the first conductivity type being in electrical contact with a low voltage terminal such that charge carriers of the first conductivity type are injected into the drift region from said region of the first conductivity type when the device is in the on-state and providing current conduction in a first direction;
- the second end of the drift region having adjacent thereto a region of the first conductivity type which is adjacent a region of the second conductivity type, at least said region of the second conductivity type being in electrical contact with a high voltage terminal such that charge carriers of the second conductivity type are injected into the drift region from said region of the second conductivity type when the device is in the on-state and providing current conduction in said first direction;
- a first insulated gate terminal at or towards the first end of the drift region and positioned at least partly over the region of the second conductivity type at the first end of the drift region;
- a second insulated gate terminal at or towards the second end of the drift region and positioned at least partly over the region of the first conductivity type at the second end of the drift region;
- and,
- one or more drive circuits constructed and arranged:
- (i) to provide a voltage of a first polarity to the second insulated gate terminal relative to the high voltage terminal and to provide a voltage of a second, opposite polarity to the first insulated gate terminal relative to the low voltage terminal, so as to allow current conduction in said first direction;
- and,
- (ii) to provide a voltage of the second polarity to the second insulated gate terminal relative to the high voltage terminal and to provide a zero voltage or a voltage of the first polarity to the first insulated gate terminal relative to the low voltage terminal, so as to allow current conduction in a second direction that is opposite the first direction.
A method of operating a bipolar high voltage/power semiconductor device, the device comprising:
- a drift region of a first conductivity type and having first and second ends;
- the first end of the drift region having adjacent thereto a region of a second conductivity type which is adjacent a region of the first conductivity type, at least said region of the first conductivity type being in electrical contact with a low voltage terminal such that charge carriers of the first conductivity type are injected into the drift region from said region of the first conductivity type when the device is in the on-state and providing current conduction in a first direction;
- the second end of the drift region having adjacent thereto a region of the first conductivity type which is adjacent a region of the second conductivity type, at least said region of the second conductivity type being in electrical contact with a high voltage terminal such that charge carriers of the second conductivity type are injected into the drift region from said region of the second conductivity type when the device is in the on-state and providing current conduction in said first direction;
- a first insulated gate terminal at or towards the first end of the drift region and positioned at least partly over the region of the second conductivity type at the first end of the drift region;
- and, a second insulated gate terminal at or towards the second end of the drift region and positioned at least partly over the region of the first conductivity type at the second end of the drift region, the method comprising:
- selectively applying:
- (i) a voltage of a first polarity to the second insulated gate with respect to the voltage applied to the high voltage terminal to form an inversion layer in at least said part of the region of the first conductivity type and the drift region that are under the second insulated gate and to allow current conduction in said first direction, and
- (ii) a voltage of a second, opposite polarity to the second insulated gate with respect to the voltage applied to the high voltage terminal to form an accumulation layer in at least said part of the region of the first conductivity type and the drift region that are under the second insulated gate and to allow current conduction in a second direction.
A method of operating a semiconductor device, the device having a drift region of a first conductivity type, a first buffer/well region of a second conductivity type at one end of the drift region, a first relatively highly doped region of the first conductivity type adjacent the first buffer/well region, a first terminal in electrical contact with the first buffer/well region and the first relatively highly doped region of the first conductivity type adjacent the first buffer/well region, a first insulated gate over at least the first buffer/well region and the adjacent end of the drift region, such that charge carriers of the first conductivity type are injected into the drift region from said relatively highly doped region of the first conductivity type when the device is in the on-state and providing current conduction in a first direction, and a second buffer/well region of the first conductivity type at the other end of the drift region, a second relatively highly doped region of the second conductivity type adjacent the second buffer/well region, a second terminal in electrical contact with the second buffer/well region and the second relatively highly doped region of the second conductivity type adjacent the second buffer/well region, and a second insulated gate over at least the second buffer/well region and the adjacent end of the drift region, such that charge carriers of the second conductivity type are injected into the drift region from said relatively highly doped region of the second conductivity type when the device is in the on-state and providing current conduction in said first direction, the method comprising:
- varying relative voltages applied to the first terminal, the second terminal, the first insulated gate and the second insulated gate so as to switch the device between
- (i) blocking current conduction in both of said directions,
- (ii) providing an insulated-gate bipolar transistor (IGBT) mode of conduction in said first direction and
- (iii) providing an anti-parallel diode mode of conduction in a second direction.
Dependencies are inferred from the claim text.