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US 7,605,439 B2Granted
Antireflective hard mask compositions
AssigneeRohm and Haas Electronic Materials LLC
InventorsDana A. Gronbeck, Amy M. Kwok, Chi Q. Truong, Michael K. Gallagher, Anthony Zampini
Life of this patent
Estimating the term…
Abstract
The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si content and comprise a blend of distinct resins.
Claims20
A coated substrate comprising:
- (a) an antireflective organic composition layer comprising:
- (i) one or more Si-resins;
- (ii) one or more a resins distinct from the one or more Si-resins and comprising phenyl or naphthyl groups;
- wherein the organic composition has Si content of at least 20 weight percent based on total solids weight of the composition;
- (b) a photoresist layer over the antireflective composition layer.
2 more elements
A method of forming a treating a microelectronic substrate, comprising:
- (a) applying an organic composition on a substrate, the organic composition comprising (i) one or more Si-resins and (ii) one or more a resins distinct from the one or more Si-resins and comprising phenyl or naphthyl groups;
- the organic composition having Si content of at least 20 weight percent based on total solids weight of the composition;
- (b) applying a photoresist layer above the applied organic composition.
Dependencies are inferred from the claim text.