Optical device with raster elements, and illumination system with the optical device
AssigneeCarl Zeiss SMT GmbH
InventorsWolfgang Singer, Johannes Wangler, Markus Deguenther, Birgit Kuerz, Christoph Menke
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Abstract
The invention relates to an optical device that includes (a) a first optical element with at least one first raster element, where the first raster element has a first axis, (b) a second optical element with at least one second raster element, where the second raster element has a second axis. The first raster element can be changed in its position relative to the second raster element, so that a distance between the first axis and the second axis is variable.
Claims19
A method of adjusting the illumination in a plane that is illuminated by an illumination system, wherein the illumination system comprises a first raster element and a second raster element, and wherein the position of the first raster element relative to the second raster element is changed in such a way that a predetermined illumination is achieved in said plane.
An optical device for an illumination system for a microlithographic projection exposure apparatus, comprising a first raster element which receives light of a light source, wherein the first raster element produces a light source image of the light source on a second raster element, wherein the light source image is of a magnitude and the second raster element is of a width that is larger than the magnitude of the light source image, and wherein the first raster element can be changed in its position relative to the second raster element.
An illumination system for use in microlithography, comprising a first optical element serving to form a multitude of light source images of a light source on a pupil raster element of a second optical element, wherein devices are provided by which the position of the light source images on said pupil raster element can be changed.
Dependencies are inferred from the claim text.