Method of gap-filling using amplitude modulation radio frequency power
AssigneeJusung Engineering Co., Ltd.
InventorsJeong-Hoon Han, Jin-Hyuk Yoo, Young-Rok Kim
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Abstract
A method of filling a gap on a substrate comprises disposing the substrate, on which the gap is formed, on a susceptor in a chamber; applying a source power to the chamber to generate plasmas into the chamber; supplying a process gas into the chamber; filling a thin film into a gap by applying a first bias power to the susceptor, an amplitude of the first bias power being periodically modulated; stopping supply of the process gas and cutting off the first bias power; and extinguish the plasmas in the chamber.
Claims14
A method of filling a gap on a substrate, comprising:
- disposing the substrate, on which the gap is formed, on a susceptor in a chamber;
- applying a source power to the chamber to generate plasmas into the chamber;
- supplying a process gas into the chamber;
- filling a thin film into a gap by applying a first bias power to the susceptor, an amplitude of the first bias power being periodically modulated;
- stopping supply of the process gas and cutting off the first bias power;
- and
- extinguishing the plasmas in the chamber.
A method of filling a gap on a substrate disposed on a suscepotor, comprising:
- forming plasmas over the substrate;
- supplying a process gas over the substrate;
- applying a first power to the susceptor to deposit the process gas onto the substrate and fill a thin film into the gap, the first power being modulated to have different amplitudes;
- stopping supply of the process gas and cutting off the first power;
- and
- extinguishing the plasmas.
A method of filling a gap on a substrate, the method including supplying a source power into a chamber to generate plasmas, injecting a process gas into the chamber, and supplying a bias power to a susceptor, on which the substrate is disposed, in the chamber to deposit the process gas onto the substrate and fill the gap, comprising:
- executing a first step of increasing acceleration of ion of the process gas diffused onto the substrate;
- and
- executing a second step of decreasing acceleration of ion of the process gas diffused onto the substrate,
- wherein the first step and the second step are periodically repeated.
Dependencies are inferred from the claim text.