Integrated silicon optical isolator
AssigneeZarlink Semiconductor (U.S.) Inc.
InventorThomas Joseph Krutsick
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Abstract
The present invention provides an optical isolator and a method of forming the optical isolator. Embodiments of the optical isolator include a silicon layer having at least one trench formed therein. The trench has a resistance that varies in response to electromagnetic radiation. Embodiments of the optical isolator also include at least one first diode formed in the silicon layer such that the trench encompasses the first diode. The first diode is configured to generate electromagnetic radiation in response to an applied signal. Embodiments of the optical isolator further include first and second regions formed in contact with the trench such that the resistance between the first and second contact regions varies in response to the electromagnetic radiation generated by the first diode.
Claims18
A method of forming an optical isolator, comprising:
- forming at least one trench formed in a silicon layer, said at least one trench having a resistance or current that varies in response to electromagnetic radiation;
- forming at least one first diode in the silicon layer such that said at least one trench encompasses said at least one first diode, said at least one first diode being configured to generate electromagnetic radiation in response to an applied signal;
- and
- forming first and second regions in contact with said at least one trench such that the resistance between the first and second contact regions varies in response to the electromagnetic radiation generated by said at least one first diode.
An optical isolator, comprising:
- a silicon layer having at least one trench formed therein, said at least one trench having a resistance that varies in response to electromagnetic radiation;
- at least one first radiating element formed in the silicon layer such that said at least one trench encompasses said at least one first diode, said at least one first radiating element being configured to generate electromagnetic radiation in response to an applied signal;
- and
- first and second regions formed in contact with said at least one trench such that the resistance or current between the first and second contact regions varies in response to the electromagnetic radiation generated by said at least one first radiating element.
Dependencies are inferred from the claim text.