Patterning method and methods for producing electro-optic device, color filter, illuminant, and thin-film transistor
AssigneeCanon Kabushiki Kaisha
InventorsOsamu Iketa, Nobuo Kawase, Keishi Saito, Takeo Ono
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Abstract
A patterning method forms a pattern including a lyophilic region and a lyophobic region. The method includes treating the surface of an object by exposing an atmosphere containing at least one gas selected from the group consisting of hydrogen, deuterium, deuterated hydrogen, and tritium; partially exposing the treated surface to light to form an exposed region and an unexposed region; and applying a liquid onto one of the exposed region and the unexposed region.
Claims11
A patterning method comprising:
- (a) treating the surface of an object by exposing the surface to an atmosphere comprising deuterium plasma;
- (b) partially exposing the treated surface to light to form an exposed region and an unexposed region;
- and
- (c) applying a liquid onto one of the exposed region and the unexposed region.
A method for producing an electro-optic device that includes a plurality of elements on a substrate, each said element emitting light or electrons according to electrical energy supplied, comprising:
- (a) treating the surface of the substrate by exposing the surface to an atmosphere comprising deuterium plasma;
- (b) partially exposing the treated surface to light to form exposed regions and unexposed regions;
- (c) applying a liquid onto the exposed regions or the unexposed regions;
- and
- (d) forming the elements using the liquid.
A method for producing a color filter, comprising:
- (a) treating the surface of a substrate by exposing the surface to an atmosphere comprising deuterium plasma;
- (b) partially exposing the treated surface to light to form an exposed region and an unexposed region;
- and
- (c) applying a liquid onto one of the exposed region and the unexposed region to form a color layer.
A method for producing an illuminant, comprising:
- (a) treating the surface of a substrate by exposing an atmosphere comprising deuterium plasma;
- (b) partially exposing the treated surface to light to form an exposed region and an unexposed region;
- and
- (c) applying a liquid onto one of the exposed region and the unexposed region to form an illuminant material layer.
method for producing a thin film transistor, comprising:
- (a) treating the surface of a substrate by exposing the surface to an atmosphere comprising deuterium plasma;
- (b) partially exposing the treated surface to light to form an exposed region and an unexposed region;
- and
- (c) applying a liquid onto one of the exposed region and the unexposed region to form an active material layer.
Dependencies are inferred from the claim text.